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Method for removal of a deposition from an optical element, lithographic apparatus, and method for manufacturing a device

  • US 20090025750A1
  • Filed: 07/24/2007
  • Published: 01/29/2009
  • Est. Priority Date: 07/24/2007
  • Status: Abandoned Application
First Claim
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1. A method of removing a deposition from an optical element of an apparatus, the method comprising:

  • providing a hydrogen comprising gas in at least a part of the apparatus;

    providing nitrogen radicals in said part of the apparatus for generating hydrogen radicals from the hydrogen comprising gas; and

    contacting the optical element with at least part of the hydrogen radicals to removal said deposition.

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