IN-LINE SYSTEM AND METHOD FOR MANUFACTURING A SEMICONDUCTOR PACKAGE

• US 20090028671A1
• Filed: 11/20/2007
• Published: 01/29/2009
• Est. Priority Date: 12/15/2006
• Status: Abandoned Application

• Current Assignee: Samsung Electronics Co. Ltd.
• Original Assignee: Samsung Electronics Co. Ltd.
• Inventors: Jung, Young-Seok, Jin, Ho-Tae, Cho, Bong-Su
• Application Number:
  US11/943,046
• Publication Number:
  US 20090028671A1
• Time in Patent Office: Days
• US Class Current: 414/217
• CPC Class Codes: H01L 21/67069 for drying etching
• CPC Class Codes: H01L 21/67132 Apparatus for placing on an insulating substrate, e.g. tape
• CPC Class Codes: H01L 21/67173 in-line arrangement
• CPC Class Codes: H01L 21/67207 comprising a chamber adapted to a particular process
• CPC Class Codes: H01L 21/67213 comprising at least one ion or electron beam chamber coating by ion implantation C23C; ion or electron beam tubes H01J37/00
• CPC Class Codes: H01L 21/6723 comprising at least one plating chamber electroless plating apparatuses C23C, electroplating apparatuses C25D

Abstract

An in-line system for manufacturing a semiconductor package according to principles of the present invention can prevent wafer warpage due to a back-lap process and die defects due to sticking of the die. In one embodiment, the in-line system adheres a semiconductor chip to a substrate by coating a liquid adhesive agent on a rear surface of the wafer. The processes of the in-line system are preferably performed in series. More particularly, the in-line system for manufacturing a semiconductor package can include a loading unit for loading a wafer into the system. A back-lap unit can include a grinder configured to back-grind a rear surface of the wafer received from the loading unit. A cleansing unit preferably comprises an air pressure plasma generating unit for cleansing the wafer using air pressure plasma. A coating unit can be configured to form an adhesive layer on a rear surface of the cleansed wafer by using a nozzle to coat a liquid adhesive agent onto the wafer. In the coating unit, the wafer can be rotated or not rotated depending on the desired characteristics of the adhesive layer. An attaching unit is preferably provided to attach a dicing tape on the adhesive layer formed. And an unloading unit unloads the wafer from the system. A transporting unit can be configured to transport the wafer sequentially between the loading unit, the back-lap unit, the cleansing unit, the coating unit, the attaching unit, and the unloading unit. One or more wafer chucks can be mounted to the wafer as the wafer is transported through the manufacturing processes.

Claims

1. An in-line system for manufacturing a semiconductor package, the system comprising:

a loading unit configured to load a wafer into the in-line system;

a back-lap unit configured to receive the wafer from the loading unit and to grind a rear surface of the wafer using a grinder;

a cleansing unit comprising an air pressure plasma generating unit, said cleansing unit configured to cleanse the rear surface of the wafer using air pressure plasma following grinding in the back-lap unit;

a coating unit configured to form an adhesive layer on the rear surface of the wafer that has been cleansed by the cleansing unit, wherein the coating unit is configured to coat a liquid adhesive agent onto the wafer using a nozzle;

an attaching unit configured to attach a dicing tape to the adhesive layer;

an unloading unit configured to unload the wafer; and

a transporting unit configured to transport the wafer sequentially between the loading unit, the back-lap unit, the cleansing unit, the coating unit, the attaching unit, and the unloading unit.

2. The in-line system of claim 1, wherein the transporting unit comprises:

a first discrete transporting member configured to transport the wafer from the loading unit to the back-lap unit;

a second discrete transporting member configured to transport the wafer from the back-lap unit to the cleansing unit; and

a first continuous transporting member configured to transport the wafer from the cleansing unit to the coating unit, the attaching unit, and the unloading unit in series.

3. The in-line system of claim 2, wherein the first and second discrete transporting members each comprise a robot arm.

4. The in-line system of claim 1, wherein the coating unit is configured to coat the wafer without rotating the wafer.

5. The in-line system of claim 2, wherein the transporting unit comprises a plurality of first discrete transporting members and a plurality of second discrete transporting members.

6. The in-line system of claim 2, wherein the first continuous transporting member comprises a conveyor belt.

7. The in-line system of claim 1, the system further comprising:

a vacuum absorption unit configured to receive the wafer from the coating unit and to remove bubbles in the adhesive layer using a vacuum; and

a hardening unit configured to receive the wafer from the vacuum absorption unit and to harden the adhesive layer,

wherein the transporting unit is configured to transport the wafer from the coating unit to the vacuum absorption unit, the hardening unit, and then to the unloading unit in series.

8. The in-line system of claim 7, wherein the transporting unit comprises a first continuous transporting member and a second continuous transporting member connected to the first continuous transporting member.

9. The in-line system of claim 8, wherein the second continuous transporting member comprises a conveyor belt.

10. The in-line system of claim 1, wherein the nozzle coats the liquid adhesive agent onto the wafer while the nozzle is being moved.

11. The in-line system of claim 1, wherein the nozzle comprises a slit.

12. The in-line system of claim 1, wherein the nozzle comprises a plurality of nozzles.

13. The in-line system of claim 1, wherein the wafer is configured to be transported while the wafer is attached to a wafer chuck.

14. The in-line system of claim 13, wherein the wafer chuck is a porous wafer chuck or a non-contact transporting Bernoulli wafer chuck.

15. The in-line system of claim 1, wherein the back-lap unit comprises a plurality of grinders.

16. The in-line system of claim 1, wherein after grinding in the back-lap unit, the wafer has a thickness of between about 20 to 200 μ

m.

17. The in-line system of claim 1, wherein the cleansing unit is configured to generate plasma using a reaction gas comprising one or more gases selected from the group consisting of:

oxygen, nitrogen, argon, methane, helium, and carbon dioxide.

18. The in-line system of claim 1, wherein the liquid adhesive agent comprises one or more groups selected from a group consisting of:

an epoxy-group, an acryl group, a polyimide group, and a silicon group.

19. The in-line system of claim 1, wherein the liquid adhesive agent has a viscosity in the range of between about 50 through 50000 cps.

20. The in-line system of claim 1, wherein the adhesive layer has a thickness of between about 2 to 100 μ

m.

21. The in-line system of claim 7, wherein the hardening unit is configured to harden the liquid adhesive agent using heat, infrared rays, ultraviolet rays, or microwaves.

22. An in-line system for manufacturing a semiconductor package, the system comprising:

a loading unit configured to load a wafer into the in-line system;

a back-lap unit configured to back-grind a rear surface of the wafer;

a cleansing unit comprising an air pressure plasma generating unit, said cleansing unit configured to cleanse the wafer using air pressure plasma after grinding in the back-lap unit;

a coating unit configured to form an adhesive layer on a rear surface of the wafer that has been cleansed by the cleansing unit, said coating unit configured to coat a liquid adhesive agent onto the wafer using a nozzle;

a vacuum absorption unit configured to use a vacuum to remove bubbles from the adhesive layer formed on the wafer in the coating unit;

a hardening unit configured to harden the adhesive layer;

an attaching unit configured to attach a dicing tape on the adhesive layer;

an unloading unit configured to unload the wafer; and

a transporting unit configured to transport the wafer sequentially between the loading unit, the back-lap unit, the cleansing unit, the coating unit, the vacuum absorption unit, the hardening unit, the attaching unit, and the unloading unit.

23. The in-line system of claim 22, wherein the transporting unit comprises:

a first discrete transporting member configured to transport the wafer from the loading unit to the back-lap unit;

a second discrete transporting member configured to transport the wafer from the back-lap unit to the cleansing unit;

a first continuous transporting member configured to transport the wafer in the cleansing unit;

a third discrete transporting member configured to transport the wafer from the cleansing unit to the coating unit;

a fourth discrete transporting member configured to transport the wafer from the coating unit to the vacuum absorption unit; and

a second continuous transporting member configured to transport the wafer between the vacuum absorption unit, the hardening unit, the attaching unit, and the unloading unit.

24. The in-line system of claim 23, wherein the first through fourth discrete transporting members each comprise a robot arm.

25. The in-line system of claim 23, wherein at least two of the first through fourth discrete transporting members are identical to one another.

26. The in-line system of claim 23, wherein a plurality of the first through fourth discrete transporting members are respectively comprised of a robot arm.

27. The in-line system of claim 23, wherein the first and second continuous transporting members each comprise a conveyor belt.

28. The in-line system of claim 22, wherein the nozzle is configured to drop the liquid adhesive agent in droplets onto the wafer.

29. The in-line system of claim 22, wherein the wafer is not rotated in the coating unit and wherein the nozzle coats the liquid adhesive agent onto the wafer while the nozzle is being moved.

30. The in-line system of claim 22, wherein the nozzle comprises a slit.

31. The in-line system of claim 22, wherein the nozzle comprises a plurality of nozzles.

32. The in-line system of claim 22, wherein the adhesive agent is coated onto the wafer while the wafer is being rotated.

33. The in-line system of claim 22, wherein the liquid adhesive agent is coated onto the wafer after the wafer is rotated.

34. The in-line system of claim 22, wherein the liquid adhesive agent is coated onto the wafer before the wafer is rotated.

35. The in-line system of claim 22, wherein the wafer is transported while the wafer is attached to a wafer chuck.

36. The in-line system of claim 35, wherein the wafer chuck is a porous wafer chuck or a non-contact transporting Bernoulli wafer chuck.

37. The in-line system of claim 22, wherein the back-lap unit comprises a plurality of grinders.

38. The in-line system of claim 22, wherein after the grinding in the back-lap unit, the wafer has a thickness of between about 20 to 200 μ

m.

39. The in-line system of claim 22, wherein the cleansing unit generates plasma using one or more reaction gases selected from the group consisting of:

oxygen, nitrogen, argon, methane, helium, and carbon dioxide.

40. The in-line system of claim 22, wherein the liquid adhesive agent comprises one or more groups selected from the group consisting of:

an epoxy-group, an acryl group, a polyimide group, and a silicon group.

41. The in-line system of claim 22, wherein the liquid adhesive agent has a viscosity in the range of between about 50 through 50000 cps.

42. The in-line system of claim 22, wherein the adhesive layer has a thickness of between about 2 to 100 μ

m.

43. The in-line system of claim 22, wherein the hardening unit hardens the liquid adhesive agent using heat, infrared rays, ultraviolet rays, or microwaves.

44. A method of manufacturing a semiconductor package, the method comprising:

loading a wafer into an in-line system using a loading unit;

grinding a rear surface of the wafer using a back-lap unit;

cleansing the wafer using air pressure plasma generated by an air pressure plasma generating unit arranged in a cleansing unit;

forming an adhesive layer by coating a liquid adhesive agent on the rear surface of the wafer using a coating unit;

attaching a dicing tape on the adhesive layer formed on the wafer using an attaching unit;

unloading the wafer from the in-line system using an unloading unit; and

sequentially transporting the wafer between the loading unit, the back-lap unit, the cleansing unit, the coating unit, the attaching unit, and the unloading unit using a transporting unit.

45. The method of claim 44, wherein sequentially transporting the wafer comprises:

transporting the wafer from the loading unit to the back-lap unit using a first discrete transporting member;

transporting the wafer from the back-lap unit to the cleansing unit using a second discrete transporting member; and

sequentially transporting the wafer from the cleansing unit to the coating unit, from the coating unit to the attaching unit, and from the attaching unit to the unloading unit using a first continuous transporting member.

46. The method of claim 44, further comprising:

removing bubbles in the adhesive layer using a vacuum absorption unit;

hardening the adhesive layer in a hardening unit; and

sequentially transporting the wafer between the coating unit and the vacuum absorption unit, between the vacuum absorption unit and the hardening unit; and

between the hardening unit and the attaching unit.