ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE AND ELECTROPHOTOGRAPHIC APPARATUS
First Claim
1. An electrophotographic photosensitive member comprising a support and a photosensitive layer formed on the support and containing a silicon-containing compound or a fluorine-containing compound in a surface layer in an amount of 0.6% by mass or more relative to a total solid matter of the surface layer, wherein:
- the electrophotographic photosensitive member has depressed portions which are independent from one another, in a number of from 50 or more to 70,000 or less per unit area (100 μ
m×
100 μ
m), over the entire region of a surface, and, the depressed portions each have a ratio of a depth (Rdv) that shows a distance between the deepest part of each depressed portion and the opening surface thereof to a major axis diameter (Rpc) of each depressed portion, Rdv/Rpc, of from more than 0.3 to 7.0 or less, and a depth (Rdv) of from 0.1 μ
m or more to 10.0 μ
m or less; and
the total present ratio of a fluorine element and a silicon element relative to constitutional elements in an outermost surface of the surface layer of the electrophotographic photosensitive member obtained by x-ray photoelectron spectroscopy (ESCA) is 1.0% by mass or more; and
a ratio (A/B) is larger than 0.0 and smaller than 0.5, where A (% by mass) is defined as a total content of a fluorine element and a silicon element present at a portion 0.2 μ
m inward from the outermost surface of the surface layer of the electrophotographic photosensitive member and B (% by mass) is defined as a total content of a fluorine element and a silicon element present in the outermost surface, with the contents of the fluorine element and silicon element obtained with x-ray photoelectron spectroscopy (ESCA).
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Accused Products
Abstract
An electrophotographic photosensitive member is provided which has a photosensitive layer formed on a support. The electrophotographic photosensitive member has a surface layer containing a silicon-containing compound or a fluorine-containing compound. The surface layer has a plurality of depressed portions which are independent from one another, on the surface. When the major axis diameter of the depressed portion is represented by Rpc and the distance between the deepest part and the opening surface of the depressed portion is represented by Rdv, Rdv is 0.1 μ or more to 10.0 μm or less, and the ratio of the depth (Rdv) to the major axis diameter (Rpc), Rdv/Rpc, is more than 0.3 to 7.0 or less.
31 Citations
19 Claims
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1. An electrophotographic photosensitive member comprising a support and a photosensitive layer formed on the support and containing a silicon-containing compound or a fluorine-containing compound in a surface layer in an amount of 0.6% by mass or more relative to a total solid matter of the surface layer, wherein:
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the electrophotographic photosensitive member has depressed portions which are independent from one another, in a number of from 50 or more to 70,000 or less per unit area (100 μ
m×
100 μ
m), over the entire region of a surface, and, the depressed portions each have a ratio of a depth (Rdv) that shows a distance between the deepest part of each depressed portion and the opening surface thereof to a major axis diameter (Rpc) of each depressed portion, Rdv/Rpc, of from more than 0.3 to 7.0 or less, and a depth (Rdv) of from 0.1 μ
m or more to 10.0 μ
m or less; andthe total present ratio of a fluorine element and a silicon element relative to constitutional elements in an outermost surface of the surface layer of the electrophotographic photosensitive member obtained by x-ray photoelectron spectroscopy (ESCA) is 1.0% by mass or more; and
a ratio (A/B) is larger than 0.0 and smaller than 0.5, where A (% by mass) is defined as a total content of a fluorine element and a silicon element present at a portion 0.2 μ
m inward from the outermost surface of the surface layer of the electrophotographic photosensitive member and B (% by mass) is defined as a total content of a fluorine element and a silicon element present in the outermost surface, with the contents of the fluorine element and silicon element obtained with x-ray photoelectron spectroscopy (ESCA). - View Dependent Claims (3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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2. An electrophotographic photosensitive member comprising a support and a photosensitive layer formed on the support and containing a silicon-containing compound or a fluorine-containing compound in a surface layer in an amount of 0.6% by mass or more relative to a total solid matter of the surface layer, the electrophotographic photosensitive member being used in contact with a cleaning blade on the surface thereof, wherein:
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the electrophotographic photosensitive member has depressed portions which are independent from one another, in a number of from 50 or more to 70,000 or less per unit area (100 μ
m×
100 μ
m), at least over the entire region of a surface portion of the electrophotographic photosensitive member which is in contact with the cleaning blade, and, the depressed portions each have a ratio of a depth (Rdv) that shows a distance between the deepest part of each depressed portion and the opening surface thereof to a major axis diameter (Rpc) of each depressed portion, Rdv/Rpc, of from more than 0.3 to 7.0 or less, and a depth (Rdv) of from 0.1 μ
m or more to 10.0 μ
m or less; andthe total present ratio of a fluorine element and a silicon element relative to constitutional elements in an outermost surface of the surface layer of the electrophotographic photosensitive member obtained by x-ray photoelectron spectroscopy (ESCA) is 1.0% by mass or more; and
a ratio (A/B) is larger than 0.0 and smaller than 0.5, where A (% by mass) is defined as a total content of a fluorine element and a silicon element present at a portion 0.2 μ
m inward from the outermost surface of the surface layer of the electrophotographic photosensitive member and B (% by mass) is defined as a total content of a fluorine element and a silicon element present in the outermost surface, with the contents of the fluorine element and silicon element obtained with x-ray photoelectron spectroscopy (ESCA). - View Dependent Claims (18, 19)
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Specification