Method, Computer Program and System Providing for Semiconductor Processes Optimization
First Claim
1. ) A method comprising:
- receiving a plurality of electrical metrics, corresponding target values, and corresponding weight factors, for each layer of a semiconductor;
receiving semiconductor process parameters, wherein at least one of the process parameters is specified as a statistical distribution;
determining at least one semiconductor process parameter that meets the plurality of electrical metrics within the corresponding target values according to their weight factors; and
providing an output of the at least one determined semiconductor process parameter.
1 Assignment
0 Petitions
Accused Products
Abstract
A method, computer program and system for the optimization of semiconductor process parameters given a pre-specified set of targets and constraints on electrical performance metrics are disclosed. Semiconductor process engineers who are not expert in the art of electrical analysis or mathematical optimization can readily use the method of this invention in optimizing semiconductor process parameters. Accommodates the differences in design styles, metal layer routing, and electrical metrics using priority schedules that are easy to input and understand. Enables the exploration of the process parameter space using primitive process tolerances and accurate electrical information provided by field solvers and circuit analysis programs.
4 Citations
20 Claims
-
1. ) A method comprising:
-
receiving a plurality of electrical metrics, corresponding target values, and corresponding weight factors, for each layer of a semiconductor; receiving semiconductor process parameters, wherein at least one of the process parameters is specified as a statistical distribution; determining at least one semiconductor process parameter that meets the plurality of electrical metrics within the corresponding target values according to their weight factors; and providing an output of the at least one determined semiconductor process parameter. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
-
-
9. ) A signal bearing medium tangibly embodying a program of machine-readable instructions executable by a digital processing apparatus to perform operations comprising:
-
receiving a plurality of electrical metrics, corresponding target values, and corresponding weight factors, for each layer of a semiconductor; receiving semiconductor process parameters, wherein at least one of the process parameters is specified as a statistical distribution; determining at least one semiconductor process parameter that meets the plurality of electrical metrics within the corresponding target values according to their weight factors; and providing an output of the at least one determined semiconductor process parameter. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
-
-
17. ) A system comprising:
-
a device configured to receive a plurality of electrical metrics, corresponding target values, and corresponding weight factors, for each layer of a semiconductor; a device configured to receive semiconductor process parameters, wherein at least one of the process parameters is specified as a statistical distribution; a device configured to generate a graphical user interface configured to facilitate the receiving of the process parameters, the electrical metrics, the target values, and the weight factors; a device configured to determine at least one semiconductor process parameter that meets the plurality of electrical metrics within the corresponding target values according to their weight factors; and a device configured to provide an output of the at least one determined semiconductor process parameter. - View Dependent Claims (18, 19, 20)
-
Specification