Trench photosensor for a CMOS imager
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Accused Products
Abstract
A trench photosensor for use in a CMOS imager having an improved charge capacity. The trench photosensor may be either a photogate or photodiode structure. The trench shape of the photosensor provides the photosensitive element with an increased surface area compared to a flat photosensor occupying a comparable area on a substrate. The trench photosensor also exhibits a higher charge capacity, improved dynamic range, and a better signal-to-noise ratio. Also disclosed are processes for forming the trench photosensor.
29 Citations
119 Claims
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1-105. -105. (canceled)
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106. A method of sensing photons comprising:
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receiving said photons into a trench, said trench disposed in a doped layer of a first conductivity type formed in a semiconductor substrate; activating a diode formed in said substrate adjacent said trench by absorbing said photons, said diode including a first doped region of a second conductivity type formed in a sidewall and bottom of said trench; receiving charges from said first doped region into a second doped region of said second conductivity type formed in said doped layer; and resetting a charge level of said second doped region by receiving charges from said second doped region into a conductive signal line. - View Dependent Claims (107, 108, 109, 110, 111, 112)
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113. A method of sensing light comprising:
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receiving said light through an aperture in a surface of a semiconductor substrate; absorbing said light into an internal surface of said semiconductor substrate, said internal surface defining a cavity within said semiconductor substrate; energizing an electron of said semiconductor substrate with said absorbed light; and activating a switching device using said energized electron. - View Dependent Claims (114, 115, 116, 117, 118, 119)
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Specification