Exposure apparatus, substrate processing method, and device producing method

• US 20090033890A1
• Filed: 06/29/2006
• Published: 02/05/2009
• Est. Priority Date: 06/29/2005
• Status: Abandoned Application

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Fujiwara, Tomoharu, Nakano, Katsushi
• Application Number:
  US11/922,415
• Publication Number:
  US 20090033890A1
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70608 Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist

Abstract

An exposure apparatus includes a detector which detects a defect in a thin film formed on a substrates. When the detector is provided for liquid immersion exposure in which the substrate is exposed through liquid, outflow of the liquid due to by any defect in the thin film is detected before the liquid outflows, thereby suppressing reduction in throughput in producing device and preventing any problem or inconvenience from occurring in the exposure apparatus.

Claims

1. An exposure apparatus which exposes a substrate by radiating an exposure light onto the substrate on which a thin film is formed, the exposure apparatus comprising a detector which detects a state of formation of the thin film on the substrate.

2. The exposure apparatus according to claim 1, wherein the thin film is formed by coating a predetermined material on the substrate;

and

the detector detects a coating state of the thin film.

3. The exposure apparatus according to claim 1, further comprising:

a liquid immersion mechanism which forms a liquid immersion area of a liquid on the substrate,

wherein the exposure light is radiated onto the substrate through the liquid of the liquid immersion area.

4. The exposure apparatus according to claim 3, wherein the detector detects the state of formation of the thin film before the liquid immersion area is formed on the substrate.

5. The exposure apparatus according to claim 3, wherein the thin film includes a liquid-repellent film.

6. The exposure apparatus according to claim 1, wherein the detector optically detects the state of formation of the thin film.

7. The exposure apparatus according to claim 1, wherein the detector has a light-emitting system which emits a detecting light onto the substrate, and a light-receiving system which is capable of receiving the detecting light via the substrate.

8. The exposure apparatus according to claim 7, further comprising:

a storage device which previously stores a relationship between the state of formation of the thin film and a light-receiving state of the light-receiving system; and

a judging device which judges whether or not the state of formation of the thin film is a desired state, based on the relationship stored in the storage device and on a light-receiving result of the light-receiving system.

9. The exposure apparatus according to claim 1, further comprising:

a holding member which holds the substrate which is irradiated with the exposure light; and

a transport device which is capable of transporting the substrate to the holding member,

wherein the detector is provided on a transport path of the transport device.

10. The exposure apparatus according to claim 9, further comprising a controller which controls operation of the transport device based on a result of detection performed by the detector.

11. The exposure apparatus according to claim 9, further comprising a process device which is provided on the transport path of the transport device and which processes the substrate,

wherein the detector detects the state of formation of the thin film of the substrate loaded into the process unit.

12. The exposure apparatus according to claim 1, further comprising a holding member which holds the substrate which is irradiated with the exposure light,

wherein the detector detects the state of formation of the thin film on the substrate in a state that the substrate is held by the holding member.

13. The exposure apparatus according to claim 1, wherein the detector detects the state of formation of the thin film at an edge of the substrate.

14. The exposure apparatus according to claim 1, wherein the detection of the state of formation of the thin film is detection of presence of the thin film.

40. A method for producing a device, comprising using the exposure apparatus as defined in claim 1.

15. An exposure apparatus which exposes a substrate by radiating an exposure light onto the substrate through a liquid, the exposure apparatus comprising a detector which detects a state of an edge of the substrate.

16. The exposure apparatus according to claim 15, wherein the detector detects a state of formation of a thin film at the edge of the substrate.

17. The exposure apparatus according to claim 16, wherein the thin film is formed by coating a predetermined material on the substrate;

and

the detector detects a coating state of the thin film at the edge of the substrate.

18. The exposure apparatus according to claim 16, wherein the thin film includes a liquid-repellent film.

19. The exposure apparatus according to claim 15, wherein the detector detects whether or not foreign matter is present at the edge of the substrate.

20. The exposure apparatus according to claim 15, wherein the detector detects the state of the edge before a liquid immersion area of the liquid is formed on at least a part of the substrate.

21. The exposure apparatus according to claim 20, further comprising a substrate-holding member capable of holding the substrate at a position at which the exposure light can be irradiated,

wherein the detector detects the state of the edge before the substrate is held by the substrate-holding member.

22. The exposure apparatus according to claim 21, further comprising a transport device which is capable of transporting the substrate to the substrate-holding member,

wherein the detector is provided on a transport path of the transport device.

23. The exposure apparatus according to claim 20, further comprising a first substrate-holding member capable of holding the substrate at a position at which the exposure light can be irradiated,

wherein the detector detects the state of the edge after the substrate is held by the first substrate-holding member.

24. The exposure apparatus according to claim 23, wherein the first substrate-holding member is moved into a first area in which the exposure light can be irradiated after the detector detects the state of the edge of the substrate held by the first substrate-holding member.

25. The exposure apparatus according to claim 23, wherein the first substrate-holding member is movable while holding the substrate in a predetermined area including a first area in which the exposure light can be irradiated and a second area which is different from the first area;

and

the detector detects the state of the edge of the substrate held by the first substrate-holding member in the second area.

26. The exposure apparatus according to claim 25, further comprising a second substrate-holding member which is movable while holding the substrate independently from the first substrate-holding member in the predetermined area,

wherein the second substrate-holding member is arranged in the first area when the first substrate-holding member is arranged in the second area.

27. The exposure apparatus according to claim 26, wherein the detector detects the state of the edge of the substrate held by the first substrate-holding member in the second area concurrently with at least a part of the exposure performed for another substrate held by the second substrate-holding member in the first area.

28. The exposure apparatus according to claim 27, wherein position information about the substrate held by the first substrate-holding member is obtained in the second area concurrently with at least a part of the exposure performed for the another substrate held by the second substrate-holding member in the first area.

29. The exposure apparatus according to claim 28, wherein the detector includes an optical device which obtains the position information.

30. The exposure apparatus according to claim 15, wherein the detector includes an image pickup device which obtains an optical image of the edge.

50. A method for producing a device, comprising using the exposure apparatus as defined in claim 15.

31. An exposure apparatus which exposes a substrate by radiating, through a liquid, an exposure light onto the substrate on which a thin film is formed, the exposure apparatus comprising:

an optical system which is arranged in an optical path for the exposure light; and

a detector which detects a defect of the thin film of the substrate to which the liquid is provided.

32. The exposure apparatus according to claim 31, wherein the defect of the thin film is absence of the thin film.

33. The exposure apparatus according to claim 31, wherein the defect of the thin film is a defect of the thin film at an edge of the substrate.

34. The exposure apparatus according to claim 31, wherein the detector detects the defect of the thin film in a state that the liquid is absent on the thin film.

35. The exposure apparatus according to claim 31, wherein the detector is provided in a transport path via which the substrate is transported to the exposure apparatus.

36. The exposure apparatus according to claim 31, further comprising a temperature-adjusting device which adjusts a temperature of the substrate, wherein the detector is provided for the temperature-adjusting device.

37. The exposure apparatus according to claim 31, wherein the exposure apparatus has an exposure station and a measuring station, wherein the detector is provided for the measuring station.

38. The exposure apparatus according to claim 37, further comprising a substrate-holding member which is movable between the exposure station and the measuring station while holding the substrate.

39. The exposure apparatus according to claim 31, wherein the thin film is a photosensitive material or a protective film.

51. A method for producing a device, comprising using the exposure apparatus as defined in claim 31.

41. A method for processing a substrate, on which a film is formed, for exposure-processing the substrate, the method comprising:

holding the substrate by a substrate-holding member;

radiating an exposure light through a liquid onto the substrate held by the substrate-holding member to exposure-process the substrate; and

detecting a state of the film of the substrate before radiating the exposure light onto the substrate.

42. The method for processing the substrate according to claim 41, wherein the detection of the state of the film of the substrate is executed before the substrate is held by the substrate-holding member.

43. The method for processing the substrate according to claim 41, wherein the detection of the state of the film of the substrate includes detection of the state of the film at an edge of the substrate.

44. The method for processing the substrate according to claim 41, wherein the detection of the state of the film of the substrate includes detection of absence of the film.

49. A method for producing a device, comprising exposure-processing a substrate by using the method for processing the substrate as defined in claim 41;

developing the exposed substrate; and

processing the developed substrate.

45. A method for processing a substrate to be exposed through a liquid, the method comprising:

forming a thin film on the substrate;

inspecting a defect of the thin film;

supplying the liquid onto the thin film; and

radiating an exposure light onto the substrate through the supplied liquid.

46. The method for processing the substrate according to claim 45, wherein the liquid is supplied onto the thin film only when result of the inspection is that the defect of the thin film is absent.

47. The method for processing the substrate according to claim 45, wherein the formation of the thin film, the radiation of the exposure light, and the inspection of the defect of the thin film are performed at mutually different positions.

48. The method for processing the substrate according to claim 45, wherein the defect of the thin film includes absence of the thin film or a defect of the thin film at an edge of the substrate.

52. A method for producing a device, comprising exposure-processing a substrate as defined in claim 45;

developing the exposed substrate; and

processing the developed substrate.