Limiting a Portion of a Patterning Device Used to Pattern A Beam

• US 20090033897A1
• Filed: 05/27/2008
• Published: 02/05/2009
• Est. Priority Date: 06/20/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: BLEEKER, Arno Jan
• Granted Patent: US 7,894,041 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70066 Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70425 Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Abstract

A system and method are used to limit a proportion of a programmable patterning means used to pattern a substrate. This is done such that a size of a repeated pattern to be exposed on the substrate is an integer multiple of a size of a pattern exposed on the substrate by the patterned beam.

Claims

1. A lithographic apparatus, comprising:

an illumination system configured to condition a beam of radiation;

a patterning device configured to pattern the beam with a plurality of pixels having a pixel size;

a projection system configured to project the patterned beam onto a target portion of a substrate; and

a controller configured to limit a portion of the patterning device that is used to generate the patterned beam for respective ones of a plurality of sub-exposures that is used to expose a repeating pattern on the substrate, wherein the controller is configured to offset a position of a first sub-exposure in the plurality of sub-exposures by a fraction of the pixel size relative to a second sub-exposure in the plurality of sub-exposures.

2. The lithographic apparatus of claim 1, wherein the controller is configured to limit the portion of the patterning device such that a sum of sizes of the plurality of sub-exposures, in a first direction, substantially equals a size of the repeating pattern that is exposed on the substrate, in the first direction.

3. The lithographic apparatus of claim 1, wherein the controller is configured to expose the target portion of the substrate by a first pixel of the patterning device during the first sub-exposure and by a second pixel of the patterning device during the second sub-exposure in the plurality of sub-exposures.

4. The lithographic apparatus of claim 1, wherein the controller is configured to expose the target portion of the substrate with different levels of radiation during respective sub-exposures in the plurality of sub-exposures.

5. The lithographic apparatus of claim 1, wherein the controller is configured to adjust the patterning device to adjust a position of an edge of a pattern features.

6. The lithographic apparatus of claim 1, wherein the patterning device is configured to reduce a size of a respective one of a plurality of sub-exposures by an integer multiple of a number of pixels.

7. The lithographic apparatus of claim 1, wherein the controller is configured to adjust timing of the illumination system.

8. The lithographic apparatus of claim 1, wherein the controller is configured to control a movable barrier that substantially prevents a portion of the patterned beam from being projected onto the substrate.

9. The lithographic apparatus of claim 1, wherein the controller is configured to control a movable barrier that substantially prevents a portion of the beam from being incident on and patterned by the patterning device.

10. The lithographic apparatus of claim 1, wherein the controller is configured to control another patterning device configured to control which portions of the beam are incident on and patterned by the patterning device.

11. The lithographic apparatus of claim 10, wherein the patterning device and the another patterning device are configured to each generate three or more gray levels.

12. The lithographic apparatus of claim 1, wherein the controller is configured to control another patterning device configured to control which portions of the patterned beam are projected onto the substrate.

13. The lithographic apparatus of claim 12, wherein the patterning device and the another patterning device are configured to each generate three or more gray levels.

14. The lithographic apparatus of 1, wherein the controller is configured to control a device configured to identify portions of the patterning device having faults, such that a number of the faults in the portion of the patterning device being used are minimized.

15. A method, comprising:

(a) projecting a patterned beam patterned using a patterning device with a plurality of pixels having a pixel size at a target portion of a substrate;

(b) limiting a portion of the patterning device that is used to generate the patterned beam for respective sub-exposures in a plurality of sub-exposures used to expose a repeating pattern on the substrate; and

(c) offsetting a position of a first sub-exposure in the plurality of sub-exposures by a fraction of the pixel size relative to a second sub-exposure in the plurality of sub-exposures.

16. The method of claim 15, wherein a sum of sizes of respective ones of the sub-exposures, in a direction, equals a size of the repeating pattern exposed on the substrate, in the direction.

17. The method of claim 15, wherein step (c) comprises:

limiting the portion of the patterning device that is used to generate the patterned beam for a first set of the respective sub-exposures of the plurality of sub-exposures used to expose the repeating pattern; and

not limiting the portion of the pattering device used to generate the patterned beam for a second set of the respective sub-exposures of the plurality of sub-exposures used to expose the repeating pattern.

18. The method of claim 15, wherein step (c) comprises:

using a movable barrier to substantially prevent a portion of the beam from being received by the patterning device or substantially prevent a portion of the patterned beam from being projected onto the substrate.

19. The method of claim 15, wherein step (c) comprises:

using another patterning device to substantially prevent a portion of the beam from being received by the patterning device or to substantially prevent a portion of the patterned beam from being projected onto the substrate.

20. The method of claim 15, further comprising:

(d) identifying regions of the patterning device having faults; and

(e) minimizing the portions of the patterning device having the faults from being used to pattern the beam.