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Method of Measuring Shot Shape and Mask

  • US 20090033948A1
  • Filed: 03/23/2006
  • Published: 02/05/2009
  • Est. Priority Date: 03/25/2005
  • Status: Active Grant
First Claim
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1. A method of measuring shot shape comprising:

  • sequentially exposing a substrate with main scale marks in compliance with a predetermined map, and forming a reference grid including a plurality of the main scale marks arranged in the predetermined map in at least one shot region;

    exposing a shot for measuring, via a projection optical system, that includes a plurality of auxiliary scale marks arranged in the predetermined map in the shot region;

    measuring a relative positional relationship between adjacent main scale marks;

    measuring an amount of deviation between the main scale marks and the auxiliary scale marks; and

    correcting the reference grid based on the relative positional relationship, and calculating a shot shape of the shot for measuring based on the corrected reference grid and the amount of deviation.

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