Device patterning using irradiation

• US 20090039290A1
• Filed: 12/29/2005
• Published: 02/12/2009
• Est. Priority Date: 12/30/2004
• Status: Active Grant

• Current Assignee: E. I. du Pont de Nemours and Company (Corteva, Inc.)
• Original Assignee: E. I. du Pont de Nemours and Company (Corteva, Inc.)
• Inventors: Troung, Nugent, Prakash, Shiva
• Granted Patent: US 8,350,238 B2
• Time in Patent Office: Days
• US Class Current: 250/492.100
• CPC Class Codes: G03F 7/7035 Proximity or contact printers
• CPC Class Codes: G03F 7/70383 Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams maskless lithography using a programmable mask G03F7/70291
• CPC Class Codes: H10K 71/00 Manufacture or treatment specially adapted for the organic devices covered by this subclass
• CPC Class Codes: H10K 71/211 by selective transformation of an existing layer

Abstract

In one embodiment, a method for creating a pattern in a layer of an organic electronic device that includes selectively irradiating a portion of the layer is provided, and devices and sub-assemblies made by the same.

Claims

1. A method for creating a pattern in a layer of an organic electronic device, comprising:

selectively irradiating a portion of the layer.

2. The method of claim 1, wherein the layer is not an active layer.

3. The method of claim 1, wherein a portion of the layer that is not irradiated remains conducting, thereby creating a pattern formed from the conducting and non-conducting portions of the buffer layer.

4. The method of claim 1, wherein the portion of the layer is irradiated with ultraviolet light.

5. The method of claim 4, further comprising applying a mask to the layer to block the ultraviolet light from a portion of the layer desired to be conducting.

6. The method of claim 1, further comprising:

depositing a polymer layer onto the layer; and

performing cathode deposition through a mask, wherein the mask surrounds at least one feature desired to be conducting.

7. The method of claim 6, further comprising depositing a contact and lead line to the polymer layer.

8. The method of claim 1, wherein the atmosphere comprises air.

9. A system for creating a pattern in an organic electronic device, comprising:

a layer of the organic electronic device; and

a light source for selectively irradiating a portion of the layer, wherein the selectively irradiated portion becomes non-conducting upon irradiation.

10. The system of claim 9, wherein the light source creates a pattern formed from a conducting portion and the non-conducting portion of the layer.

11. The system of claim 9, wherein the light source is an ultraviolet light source.

12. The system of claim 11, wherein the ultraviolet light source is a laser.

13. The system of claim 11, wherein the ultraviolet light source is an ultraviolet light bulb.

14. The system of claim 9, further comprising a mask for blocking the irradiation from a portion of the layer desired to be luminescent.

15. An organic electronic device, comprising:

a buffer layer, wherein the buffer layer has a conducting portion and a non-conducting portion, and wherein the non-conducting portion of the buffer layer has been irradiated with ultraviolet light.

16. The device of claim 15, wherein a polymer layer has been deposited onto the buffer layer.

17. The device of claim 15, wherein the buffer layer is (Poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate)).

18. A composition including the organic electronic device of claim 15.

19. An organic electronic device having an active layer including the organic electronic device of claim 15.

20. An article useful in the manufacture of an organic electronic device, comprising the organic electronic device of claim 15.