Programmable Interconnect Structures

• US 20090039917A1
• Filed: 02/16/2008
• Published: 02/12/2009
• Est. Priority Date: 10/21/2002
• Status: Active Grant

• Current Assignee: Callahan Cellular LLC (Intellectual Ventures LLC)
• Original Assignee: Tier Logic, Inc.
• Inventors: Madurawe, Raminda Udaya
• Granted Patent: US 7,679,399 B2
• Time in Patent Office: Days
• US Class Current: 326/38
• CPC Class Codes: H03K 19/17704 the logic functions being realised by the interconnection of rows and columns
• CPC Class Codes: H03K 19/17736 Structural details of routing resources
• CPC Class Codes: H03K 19/1776 for memories
• CPC Class Codes: H03K 19/1778 Structural details for adapting physical parameters
• CPC Class Codes: H03K 19/17796 for physical disposition of blocks

Abstract

A programmable interconnect structure for an integrated circuit comprises: a pass-gate fabricated on a substrate layer to electrically connect a first node to a second node; and a configuration circuit including at least one memory element to control said pass-gate fabricated substantially above said substrate layer; and a programmable method to select between isolating said first and second nodes and connecting said first and second nodes.

A programmable buffer structure for an integrated circuit comprises: a first and a second terminal; and a programmable pull-up and a programmable pull-down circuit coupled between said first and second terminals; and a configuration circuit including at least one memory element coupled to said pull-up and pull-down circuits; and a programmable method to select between isolating said first terminal from second terminal by deactivating said pull-up and pull-down circuits, and coupling said first terminal to second terminal by activating said pull-up and pull-down circuits.

A method of forming a programmable interconnect structure for an integrated circuit comprises: fabricating one or more pass-gates on a substrate layer to electrically connect two points; and selectively fabricating either a memory circuit or a conductive pattern substantially above said pass-gates to control a portion of said pass-gates; and fabricating an interconnect and routing layer substantially above said memory circuits to connect said pass-gates and one of said memory circuits and conductive pattern.

Claims

1. A programmable interconnect structure to couple a first node to a second node of an integrated circuit comprising:

a pass-gate to electrically couple the first node to the second node fabricated on a substrate layer; and

a configuration circuit including at least one memory element to control said pass-gate fabricated substantially above said substrate layer, wherein changing data stored in the memory element provides a programmable method to achieve one of;

isolate said first node from said second node; and

couple said first node to said second node.

2. The structure of claim 1, wherein said configuration circuit comprises one or more of:

a thin film diode, thin film resistor, thin film capacitor and a thin film transistor.

3. The structure of claim 1, wherein said memory element comprises one of:

a volatile memory element and a non volatile memory element.

4. The structure of claim 1, wherein said memory element comprises one or more of:

a fuse link, an anti-fuse capacitor, a resistor, a capacitor, an SRAM cell, a DRAM cell, a metal optional link, an EPROM cell, an EEPROM cell, a flash cell, a ferro-electric element, an optical element, a carbon nano-tube, a resistance modulating element, a capacitance modulating element, and a magnetic element.

5. The structure of claim 1, wherein said programmable method is further comprised of:

providing configuration access to alter data in the stored memory element; and

generating a control signal from said memory element; and

controlling the polarity of said control signal by said stored memory bit polarity; and

coupling said control signal to the gate electrode of said pass-gate; and

selecting one of turning said pass-gate off to isolate said first node from said second node, and turning said pass-gate on to couple said first node to second node.

6. A programmable interconnect structure for an integrated circuit comprising:

a pass-gate to electrically connect two nodes; and

a configurable memory circuit comprising one of;

a user configurable memory element for a user to program a desired state; and

a mask configurable memory element to permanently fix a desired state; and

an interconnect and routing layer substantially above said pass-gates to connect said pass-gate and said configurable memory circuit; and

a programmable method to select between isolating said first and second nodes and connecting said first and second nodes by changing data in the configurable memory circuit.

7. The structure of claim 6, wherein the configurable memory circuit is located substantially above said pass-gate.

8. The structure of claim 6, wherein the configurable memory circuit comprises a user configurable memory element located substantially above said pass-gate.

9. The structure of claim 6, wherein the user configurable memory element comprises one or more of:

a fuse link, an anti-fuse capacitor, a resistor, a capacitor, an SRAM cell, a DRAM cell, a metal optional link, an EPROM cell, an EEPROM cell, a flash cell, a ferro-electric element, an optical element, a carbon nano-tube, a resistance modulating element, a capacitance modulating element, and a magnetic element.

10. The structure of claim 6, wherein said mask configurable memory element is a conductive pattern comprising hard wire controls to replicate a desired user configurable memory element output, wherein replicating comprises:

a logic zero user configurable memory element output mapped to a hard wire coupled to ground; and

a logic one user configurable memory element output mapped to a hard wire coupled to power.

11. The structure of claim 10, wherein a given configuration of said configurable memory element and said corresponding conductive pattern provide one or more substantially matching signal propagation delays in the interconnect structure.

12. The structure of claim 6, wherein said mask configurable memory element is a conductive pattern to hard-wire the user configurable memory element output to a desired state.

13. The structure of claim 12, wherein said mask configurable memory element provides a substantial power reduction for the interconnect structure compared to the user configurable memory element.

14. The structure of claim 6, wherein said mask configurable memory element is a conductive wire pattern to replicate a desired user configurable memory element output, wherein replicating comprises:

a logic zero configurable memory element output mapped to decoupling wire connections between said first, second, or both nodes and the pass-gate; and

a logic one configurable memory element output mapped to a wire shorting said first and second nodes.

15. The structure of claim 14, wherein a said replicated conductive wire pattern of a given user configurable memory element output provides a substantially improved signal propagation delays in the interconnect structure.

16. A programmable interconnect structure for an integrated circuit comprising:

a plurality of pass-gates to electrically couple a plurality of nodes; and

a configurable memory circuit comprising either user configurable memory elements or mask configurable memory elements to identify desired memory states; and

one or more interconnect and routing layers to couple;

said plurality of pass-gate to said plurality of nodes; and

said plurality of pass-gates to said configurable memory circuit;

wherein, identifying the desired memory states select the interconnect pattern between the plurality of nodes without altering the layout of said plurality of pass-gates and the locations of the plurality of nodes.

17. The structure of claim 16, wherein the configurable memory circuit is located substantially above said pass-gate.

18. The structure of claim 16, wherein the configurable memory circuit comprises a user configurable memory element located substantially above said pass-gate.

19. The structure of claim 16, wherein the configurable memory element comprises one or more of:

a fuse link, an anti-fuse capacitor, a resistor, a capacitor, an SRAM cell, a DRAM cell, a metal optional link, an EPROM cell, an EEPROM cell, a flash cell, a ferro-electric element, an optical element, a carbon nano-tube, a resistance modulating element, a capacitance modulating element, and a magnetic element.

20. The structure of claim 16, wherein a user finalizes an optimal interconnect pattern by iteratively configuring the user configurable memory elements and then hard-coding the finalized memory pattern to mask configurable memory elements to achieve one or more of:

cost reduction, yield improvement, storage device elimination, power reduction, performance improvement, reliability improvement, manufacturing simplification and security improvement.