Submicron Structures In Dye-Doped Polymer Materials

• US 20090040579A1
• Filed: 08/07/2008
• Published: 02/12/2009
• Est. Priority Date: 08/07/2007
• Status: Abandoned Application

• Current Assignee: The Board of Regents of the University of Colorado (University of Colorado System)
• Original Assignee: The Board of Regents of the University of Colorado (University of Colorado System)
• Inventors: McKenna, Edward M. JR., Mickelson, Alan R.
• Application Number:
  US12/188,050
• Publication Number:
  US 20090040579A1
• Time in Patent Office: Days
• US Class Current: 359/15
• CPC Class Codes: G02B 2006/12107 Grating
• CPC Class Codes: G02B 2006/1219 Polymerisation
• CPC Class Codes: G02F 1/353 Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
• CPC Class Codes: G02F 1/355 characterised by the materials used
• CPC Class Codes: G02F 1/365 in an optical waveguide structure G02F1/377, G02F1/395 take precedence
• CPC Class Codes: G02F 2202/022 polymeric

Abstract

A nonlinear dye-doped polymer optical rectification detector has an optical input for receiving a modulated optical carrier signal, an optical structure for conveying the modulated optical carrier through the detector, and an electrical structure overlaid with the optical structure arranged to optimize matching between electrical and optical waves and to enhance the second order nonlinearity of polymer in the detector. A planar waveguide fabrication method deposits a thin dye-doped polymer film onto a substrate, photobleaches one or more waveguides into the thin dye-doped polymer film, anneals the one or more waveguides to relieve stresses induced during the photobleaching process, and then forms endfaces by cleaving the substrate.

Claims

1. A nonlinear dye-doped polymer optical rectification detector comprising:

optical input for receiving a modulated optical carrier signal;

optical structure for conveying the modulated optical carrier through the detector; and

electrical structure overlaid with the optical structure arranged to optimize matching between electrical and optical waves and to enhance the second order nonlinearity of polymer in the detector.

2. The optical rectification detector of claim 1, the efficiency of the detector increasing as the frequency of the optical carrier signal increases.

3. A method of manufacturing a dye-doped polymer optical rectification detector, comprising:

forming a cladding layer on a substrate;

forming a nonlinear polymer layer on the cladding layer;

photobleaching waveguides into the polymer layer;

annealing after the step of photobleaching to relieve stress in the nonlinear polymer layer;

forming a top cladding layer onto the nonlinear polymer layer;

depositing a metal layer onto the top cladding layer;

etching coplanar waveguides into the metal layer;

heating the optical rectification detector;

applying a poling voltage to electrodes formed on the metal layer for a period determined by monitoring the poling current; and

forming waveguide endfaces for interfacing to an optical carrier signal.

4. The method of claim 3, wherein one or more of the cladding layer, the nonlinear polymer layer and the top cladding layer are formed by a spinning deposition technique.

5. A method for reducing the group velocity of light in a dye-doped polymer optical rectification detector, comprising:

writing a Bragg grating holographically into one or more waveguides of the detector;

writing a super period holographically into the waveguides using irreversible photobleaching to form a Moiré

grating; and

annealing the polymer of the detector in-situ to reduce stresses induced from altering the submicron structure of the grating.

6. The method of claim 5, wherein the slowing factor ranges from 1.25 to 2.6 in the resulting Moiré

grating.

7. A method for planar waveguide fabrication, comprising:

depositing a thin dye-doped polymer film onto a substrate;

photobleaching one or more waveguides into the thin dye-doped polymer film;

annealing the one or more waveguides to relieve stresses induced during the photobleaching process; and

forming endfaces by cleaving the substrate.