Exposure apparatus, exposure method, and electronic device manufacturing method
First Claim
1. An exposure apparatus that exposes a bright-dark pattern on a substrate via a projection optical system, the exposure apparatus comprising:
- a position detection system which detects a plurality of predetermined positions in a unit exposure field of the substrate, wherein a plurality of reference detection positions fall within a range substantially equal to the unit exposure field;
a deformation calculation unit which calculates a state of deformation in the unit exposure field based on the detection result of the position detection system; and
a shape modification unit which modifies a shape of the bright-dark pattern to be exposed on the substrate based on the deformation state calculated by the deformation calculation unit.
1 Assignment
0 Petitions
Accused Products
Abstract
An exposure apparatus for exposing a bright-dark pattern on a substrate via a projection optical system includes a position detection system which detects a plurality of predetermined positions in a unit exposure field of the substrate. A plurality of reference detection positions fall within a range substantially equal to the unit exposure field. A deformation calculation unit calculates a state of deformation in the unit exposure field based on the detection result of the position detection system. A shape modification unit modifies a shape of the bright-dark pattern to be exposed on the substrate based on the deformation state calculated by the deformation calculation unit.
-
Citations
32 Claims
-
1. An exposure apparatus that exposes a bright-dark pattern on a substrate via a projection optical system, the exposure apparatus comprising:
-
a position detection system which detects a plurality of predetermined positions in a unit exposure field of the substrate, wherein a plurality of reference detection positions fall within a range substantially equal to the unit exposure field; a deformation calculation unit which calculates a state of deformation in the unit exposure field based on the detection result of the position detection system; and a shape modification unit which modifies a shape of the bright-dark pattern to be exposed on the substrate based on the deformation state calculated by the deformation calculation unit. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
-
-
17. An exposure method for exposing a bright-dark pattern onto unit exposure fields on a substrate via a projection optical system, the exposure method comprising:
-
a position detection step of detecting a plurality of predetermined positions in a unit exposure field of the substrate with a position detection system which detects the plurality of predetermined positions that fall within a range substantially equal to one of the unit exposure fields; a deformation calculation step of calculating a state of deformation in the unit exposure field based on information related to the plurality of predetermined positions obtained in the position detection step; and a shape modification step of modifying a shape of the bright-dark pattern to be exposed on the substrate based on the deformation state obtained in the deformation calculation step. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32)
-
Specification