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FIELD EFFECT TRANSISTOR WITH GATE INSULATION LAYER FORMED BY USING AMORPHOUS OXIDE FILM

  • US 20090045399A1
  • Filed: 03/17/2007
  • Published: 02/19/2009
  • Est. Priority Date: 03/20/2006
  • Status: Abandoned Application
First Claim
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1. A field effect transistor comprising a channel layer, a source electrode, a drain electrode, a gate insulation layer, and a gate electrode formed on a substrate, wherein the channel layer is made of an amorphous oxides and wherein the gate insulation layer is made of an amorphous oxide containing Y.

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