FIELD EFFECT TRANSISTOR WITH GATE INSULATION LAYER FORMED BY USING AMORPHOUS OXIDE FILM
First Claim
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1. A field effect transistor comprising a channel layer, a source electrode, a drain electrode, a gate insulation layer, and a gate electrode formed on a substrate, wherein the channel layer is made of an amorphous oxides and wherein the gate insulation layer is made of an amorphous oxide containing Y.
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Abstract
A field effect transistor includes a channel layer 11, a source electrode 13, a drain electrode 14, a gate insulation layer 12 and a gate electrode 15 formed on a substrate 10. The channel layer is made of an amorphous oxide and that the gate insulation layer is made of an amorphous oxide containing Y.
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9 Claims
- 1. A field effect transistor comprising a channel layer, a source electrode, a drain electrode, a gate insulation layer, and a gate electrode formed on a substrate, wherein the channel layer is made of an amorphous oxides and wherein the gate insulation layer is made of an amorphous oxide containing Y.
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