LOW-COST NON-VOLATILE FLASH-RAM MEMORY
First Claim
Patent Images
1. A flash-RAM memory comprising:
- non-volatile random access memory (RAM) formed on a monolithic die; and
non-volatile page-mode memory formed on top of the non-volatile RAM, the non-volatile page-mode memory and the non-volatile RAM residing on the monolithic die.
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Abstract
A flash-RAM memory includes non-volatile random access memory (RAM) formed on a monolithic die and non-volatile page-mode memory formed on top of the non-volatile RAM, the non-volatile page-mode memory and the non-volatile RAM reside on the monolithic die.
177 Citations
19 Claims
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1. A flash-RAM memory comprising:
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non-volatile random access memory (RAM) formed on a monolithic die; and non-volatile page-mode memory formed on top of the non-volatile RAM, the non-volatile page-mode memory and the non-volatile RAM residing on the monolithic die. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A computer system comprising:
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a host; and flash-RAM coupled to the host configured to store data, the flash-RAM including, non-volatile random access memory (RAM) formed on a monolithic die; and non-volatile page-mode memory formed on top of the non-volatile RAM, the non-volatile page-mode memory and the non-volatile RAM residing on the monolithic die, each of the non-volatile RAM and the non-volatile page-mode memory including magnetic memory cells made of a magnetic tunnel junction (MTJ), the magnetic memory formed on the monolithic die; and transistors coupled to the non-volatile RAM and the magnetic memory and formed on silicon thereby avoiding physical contact with the monolithic die. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16, 19)
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17. A method of manufacturing a flash-RAM comprising:
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a. forming CMOS circuitry; b. depositing a first metal layer upon the CMOS circuitry; c. depositing a magnetic tunnel junction layer on top of the metal layer to form a non-volatile random-access-memory (RAM); d. depositing silicon oxide and silicon nitride on top of the non-volatile RAM; e. performing chemical mechanical polishing (CMP) on the deposited silicon oxide and silicon nitride thereby leaving a smooth surface of silicon oxide and silicon nitride; f. depositing a metal layer on top of the smooth surface; g. depositing a diode layer on top of the metal layer; h. depositing magnetic tunnel junction (MTJ) on top of the diode layer. - View Dependent Claims (18)
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Specification