SUBSTRATE PROCESSING APPARATUS AND METHOD
First Claim
Patent Images
1. A substrate processing apparatus, comprising:
- a first chamber;
a second chamber provided adjacent the first chamber to form a process space therebetween;
a support unit supporting the second chamber with a gap between the first and second chambers; and
a vacuum unit to place the process space in a vacuum state, the process spaced sealed in the vacuum state.
1 Assignment
0 Petitions
Accused Products
Abstract
A substrate processing apparatus includes a first chamber, a second chamber provided adjacent the first chamber to form a process space therebetween, a support unit supporting the second chamber with a gap between the first and second chambers, and a vacuum unit to place the process space in a vacuum state, the process spaced sealed in the vacuum state.
275 Citations
19 Claims
-
1. A substrate processing apparatus, comprising:
-
a first chamber; a second chamber provided adjacent the first chamber to form a process space therebetween; a support unit supporting the second chamber with a gap between the first and second chambers; and a vacuum unit to place the process space in a vacuum state, the process spaced sealed in the vacuum state. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
-
-
17. A method of opening/closing a process space in a substrate processing apparatus having first and second chambers, comprising:
-
providing the second chamber over the first chamber to form a gap therebetween; and closing a process space after the process space formed inside the first and second chambers is kept in a vacuum state. - View Dependent Claims (18, 19)
-
Specification