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SUBSTRATE PROCESSING APPARATUS AND METHOD

  • US 20090047433A1
  • Filed: 06/26/2008
  • Published: 02/19/2009
  • Est. Priority Date: 08/13/2007
  • Status: Abandoned Application
First Claim
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1. A substrate processing apparatus, comprising:

  • a first chamber;

    a second chamber provided adjacent the first chamber to form a process space therebetween;

    a support unit supporting the second chamber with a gap between the first and second chambers; and

    a vacuum unit to place the process space in a vacuum state, the process spaced sealed in the vacuum state.

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