Method for removing surface deposits and passivating interior surfaces of the interior of a chemical vapor deposition reactor

• US 20090047447A1
• Filed: 08/02/2006
• Published: 02/19/2009
• Est. Priority Date: 08/02/2005
• Status: Abandoned Application

• Current Assignee: Massachusetts Institute of Technology
• Original Assignee: Massachusetts Institute of Technology
• Inventors: Bai, Bo, An, Ju Jin, Sawin, Herbert H.
• Application Number:
  US11/497,790
• Publication Number:
  US 20090047447A1
• Time in Patent Office: Days
• US Class Current: 427/575
• CPC Class Codes: B08B 7/0035 by radiant energy, e.g. UV, laser, light beam or the like
• CPC Class Codes: C23C 16/4405 Cleaning of reactor or parts inside the reactor by using reactive gases
• CPC Class Codes: H01J 37/32862 In situ cleaning of vessels and/or internal parts

Abstract

The present invention relates to plasma cleaning methods for removing surface deposits from a surface, such as the interior of a depositions chamber that is used in fabricating electronic devices. The present invention also provides gas mixtures and activated gas mixtures which provide superior performance in removing deposits from a surface. The methods involve activating a gas mixture comprising a carbon or sulfur source, NF₃, and optionally, an oxygen source to form an activated gas, and contacting the activated gas mixture with surface deposits to remove the surface deposits wherein the activated gas mixture acts to passivate the interior surfaces of the apparatus to reduce the rate of surface recombination of gas phase species.

Claims

1. An activated gas mixture comprising:

from about 60% to about 75%, fluorine atoms,

from about 10% to about 30% nitrogen atoms,

optionally, up to about 15% oxygen atoms, and

from about 0.3% to about 15% of one or more atoms selected from the group consisting of carbon and sulfur.

2. An activated gas mixture as in claim 1 wherein the percentage of fluorine atoms is from about 66% to about 74%,

the percentage of nitrogen atoms is from about 11% to about 24%,

the percentage of oxygen atoms is from about 0.9% to about 11%, and

the percentage of one or more atoms selected from the group consisting of carbon and sulfur is from about 0.6% to about 11%.

3. An activated gas mixture as in claim 1 wherein the one or more atoms selected from the group consisting of carbon and sulfur is carbon.

4. An activated gas mixture as in claim 1 further comprising a carrier gas.

5. An activated gas mixture as in claim 4 wherein the carrier gas is selected from the group consisting of argon and helium.

6. An activated gas mixture as in claim 5 wherein the carrier gas is argon.

31. A process of passivating the interior surfaces of an apparatus comprising:

(a) producing an activated gas mixture of claim 1 in a remote chamber,

(b) allowing said activated gas mixture to flow through a conduit and into a process chamber, and thereafter,

(c) reducing the rate of surface recombination of gas phase species.

32. A process as in claim 31 wherein the apparatus is a PECVD apparatus.

33. A process as in claim 31 wherein the interior surfaces of the apparatus are constructed from a material selected from the group consisting of aluminum and anodized aluminum.

34. A process as in claim 31 wherein the conduit is cooled.

35. A process as in claim 31 wherein a throttle valve is used to increase the pressure in the apparatus during the cleaning cycle.

36. A process as in claim 31 wherein the gas mixture further comprises a carrier gas.

37. A process as in claim 36 wherein said carrier gas is selected from the group consisting of argon and helium.

38. A process as in claim 31 wherein the pressure in the process chamber is from about 0.5 torr to about 20 torr.

39. A process as in claim 31 wherein the pressure in the process chamber is from about 1 torr to about 15 torr.

40. A process as in claim 31 wherein the pressure in the remote chamber is from about 0.5 torr to about 15 torr.

41. A process as in claim 31 wherein the pressure in the remote chamber is from about 2 torr to about 6 torr

42. A process in claim 31 wherein said power is generated by an RF source, a DC source or a microwave source.

43. A process as in claim 42 wherein said power is generated by an RF source.

44. A PECVD apparatus comprising:

(a) a remote plasma source chamber,

(b) a gas distribution system connecting the remote plasma source to supplies of a cleaning gas and an inert gas,

(c) a PECVD chamber wherein the remote plasma chamber is coupled to the PECVD chamber by a means allowing for transfer of an activated gas according to claims 1, 2, 3, or 4, from the remote plasma chamber to the process chamber, and

(d) an exhaust line.

45. A PECVD apparatus as in claim 44 wherein the exhaust line is connected to a vacuum source.

46. A PECVD apparatus as in claim 45 wherein the vacuum source is a vacuum pump.

47. A PECVD apparatus as in claim 44 wherein the means allowing for transfer of the activated gas from the remote plasma chamber to the process chamber comprises a short connecting tube to a shower head and a direct conduit connecting the plasma source to the process chamber.

48. A PECVD apparatus as in claim 47 wherein the short connecting tube to the shower head and the direct conduit connecting the plasma source to the process chamber each further comprise a flow restricting device to vary the proportion of activated gas flowing through the two paths.

49. A PECVD apparatus as in claim 48 wherein the flow restricting device is an orifice or a valve.

50. A PECVD apparatus as in claim 44 wherein the exhaust line further comprises at least one throttle valve.

51. A PECVD apparatus as in claim 44 wherein the gas distribution system comprises piping connecting gas cylinders for each gas supplied to the PECVD chamber through individual mass flow controllers for each gas, into a mixing chamber and thence connected to the remote plasma source chamber.

52. A PECVD apparatus as in claim 44 wherein the gas distribution system comprises piping connecting a cylinder of a cleaning gas mixture through a mass flow controller into the remote plasma source chamber, and piping connecting a source of inert gas through a mass flow controller and into the remote plasma source chamber.

53. A PECVD apparatus as in claim 44 wherein the means allowing for transfer of the activated gas from the remote plasma chamber to the process chamber is cooled.

54. A PECVD apparatus as in claim 44 wherein the exhaust line piping is either aluminum or anodized aluminum and is cooled.

65. A cleaning gas mixture as in claim 36 wherein the perfluorocarbon is octafluorocyclobutane.

7. A process for etching and removing surface deposits on the interior surfaces of a CVD apparatus, comprising:

activating in a remote chamber a gas mixture comprising an oxygen source, a source of one or more atoms selected from the group consisting of carbon and sulfur, and NF₃, wherein the molar ratio of oxygen source;

source of one or more atoms selected from the group consisting of carbon and sulfur is at least about 0.75;

1, and wherein the molar percentage of NF₃ in the said gas mixture is from about 50% to about 98%;

allowing said activated gas mixture to flow through a conduit and into a process chamber, thereby reducing the rate of surface recombination of gas phase species on the interior surfaces of said CVD apparatus.

8. A process as in claim 7 wherein the one or more atoms selected from the group consisting of carbon and sulfur is carbon.

9. A process as in claim 7 wherein the apparatus is a PECVD apparatus.

10. A process as in claim 7 wherein the interior surfaces of the apparatus are constructed from a material selected from the group consisting of aluminum and anodized aluminum.

11. A process as in claim 7 wherein the conduit is cooled.

12. A process as in claim 7 wherein a throttle valve is used to increase the pressure in the apparatus during the cleaning cycle.

13. A process as in claim 8 wherein the oxygen source is molecular oxygen.

14. A process as in claim 8 wherein the carbon source is a fluorocarbon.

15. A process as in claim 14 wherein the fluorocarbon is a perfluorocarbon.

16. A process as in claim 14 wherein the fluorocarbon is selected from the group consisting of tetrafluoromethane, hexafluoroethane, octafluoropropane, perfluorotetrahydrofuran, and octafluorocyclobutane.

17. A process as in claim 14 wherein the fluorocarbon is hexafluoroethane.

18. A process as in claim 14 wherein the fluorocarbon is octafluorocyclobutane.

19. A process as in claim 7 wherein the molar percentage of NF₃ is from about 60% to about 98% of the gas mixture.

20. A process as in claim 7 wherein the NF₃ is from about 70% to about 90% of the gas mixture.

21. A process as in claim 14 wherein the oxygen source:

carbon source ratio is about 1;

1.

22. A process as in claim 14 wherein the oxygen source and the carbon source are carbon dioxide and the molar percentage of carbon dioxide in the gas mixture is from about 2% to about 15%.

23. A process as in claim 7 wherein the gas mixture further comprises a carrier gas.

24. A process as in claim 23 wherein said carrier gas is selected from the group consisting of argon and helium.

25. A process as in claim 7 wherein the pressure in the process chamber is from about 0.5 torr to about 20 torr.

26. A process as in claim 7 wherein the pressure in the process chamber is from about 1 torr to about 15 torr.

27. A process as in claim 7 wherein the pressure in the remote chamber is from about 0.5 torr to about 15 torr.

28. A process as in claim 27 wherein the pressure in the remote chamber is from about 2 torr to about 6 torr

29. A process in claim 7 wherein said power is generated by an RF source, a DC source or a microwave source.

30. A process as in claim 29 wherein said power is generated by an RF source.

55. A gas mixture for cleaning a CVD reactor, comprising in molar percent of the gas,

up to 25% of an oxygen source gas,

from about 50% to about 98% of an inorganic fluorine source gas,

up to about 25% of a carbon source gas, and

up to about 25% of a sulfur source gas, wherein the combined amount of the carbon source gas plus the amount of the sulfur source gas is 1% to 25%.

56. The gas mixture of claim 55, wherein the inorganic fluorine source gas is NF₃.

57. The gas mixture of claim 55, wherein the carbon source gas is a fluorocarbon or a hydrocarbon.

58. The gas mixture of claim 57, wherein the carbon source gas is CO₂, CH₄, C₂F₈, or octofluorocyclobutane.

59. The gas mixture of claim 55, wherein the sulfur source gas is SF₆.

60. A cleaning gas mixture comprising from about 50% to about 98% on a molar basis NF₃, an oxygen source and a fluorocarbon.

61. A cleaning gas mixture as in claim 60 wherein the oxygen source is molecular oxygen.

62. A cleaning gas mixture as in claim 60 wherein the fluorocarbon is a perfluorocarbon.

63. A cleaning gas mixture as in claim 62 wherein the perfluorocarbon is selected from the group consisting of tetrafluoromethane, hexafluoroethane, octafluoropropane, perfluorotetrahydrofuran and octafluorocyclobutane.

64. A cleaning gas mixture as in claim 62 wherein the perfluorocarbon is hexafluoroethane.

66. A cleaning gas mixture as in claim 61 wherein the oxygen:

fluorocarbon ratio is at least about 0.75;

1.0.

67. A cleaning gas mixture as in claim 61 wherein the oxygen:

fluorocarbon ratio is at least about 1;

1.