SOLAR CONTROL LOW-EMISSIVITY COATINGS

• US 20090047466A1
• Filed: 08/14/2007
• Published: 02/19/2009
• Est. Priority Date: 08/14/2007
• Status: Active Grant

• Current Assignee: Cardinal CG Company (Cardinal Glass Industries Incorporated)
• Original Assignee: Cardinal CG Company (Cardinal Glass Industries Incorporated)
• Inventors: German, John R., Pfaff, Gary L.
• Granted Patent: US 7,807,248 B2
• Time in Patent Office: Days
• US Class Current: 428/98
• CPC Class Codes: C03C 17/36 at least one coating being a metal
• CPC Class Codes: C03C 17/3618 Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
• CPC Class Codes: C03C 17/3639 Multilayers containing at least two functional metal layers
• CPC Class Codes: C03C 17/3644 the metal being silver
• CPC Class Codes: C03C 17/3652 the coating stack containing at least one sacrificial layer to protect the metal from oxidation
• CPC Class Codes: C03C 17/366 Low-emissivity or solar control coatings
• CPC Class Codes: Y10T 428/24 Structurally defined web or sheet [e.g., overall dimension, etc.]

Abstract

A substrate bearing a solar control low-emissivity coating. The solar control low-emissivity coating includes one or more dielectric absorber films. In some embodiments, the dielectric absorber film has an absorption ratio of k_{380<λ<450 nm}/k_{650<λ<760 nm} that is less than 1.9.

Claims

1. A transparent substrate bearing a solar control low-emissivity coating, the coating comprising:

an innermost infrared-reflective film comprising silver and an outermost infrared-reflective film comprising silver;

a first dielectric absorber film between the substrate and the innermost infrared-reflective film, the first dielectric absorber film having a neutral absorption ratio of k<sub>380<

λ

<

450 nm</sub>/k<sub>650<

λ

<

760 nm</sub> between 0.52 and 1.9; and

a second dielectric absorber film further from the substrate than the outermost infrared-reflective film, the second dielectric absorber film having a neutral absorption ratio of k<sub>380<

λ

<

450 nm</sub>/k<sub>650<

λ

<

760 nm</sub> between 0.52 and 1.9.

2. The substrate of claim 1 wherein the coating is a double-type low-emissivity coating with a middle coat between the innermost and outermost infrared-reflective films, wherein the middle coat does not include any dielectric absorber film but rather consists essentially of transparent dielectric film.

3. The substrate of claim 1 wherein the coating is a triple-type low-emissivity coating, which further includes an intermediate infrared-reflective film comprising silver, the coating having a first spacer coat between the innermost and intermediate infrared-reflective films, and having a second spacer coat between the intermediate and outermost infrared-reflective films, wherein the spacer coats do not include any dielectric absorber films but rather consist consisting essentially of transparent dielectric film.

4. The substrate of claim 1 wherein the first and second dielectric absorber films both comprise nitride film.

5. The substrate of claim 1 wherein at least one of the first and second dielectric absorber films comprises a compound nitride including silicon nitride mixed with another nitride.

6. The substrate of claim 1 wherein the first and second dielectric absorber films both comprise a compound nitride including silicon nitride mixed with at least one other nitride selected from the group consisting of titanium nitride, niobium nitride, zirconium nitride, chromium nitride, and nickel-chrome nitride.

7. The substrate of claim 1 wherein at least one of the first and second dielectric absorber films comprises titanium nitride and/or niobium nitride.

8. The substrate of claim 1 wherein the first and second dielectric absorber films each have an optical thickness of less than 600 Å

.

9. The substrate of claim 1 wherein the coated substrate has a monolithic visible transmittance of less than 0.60.

10. The substrate of claim 9 wherein the monolithic visible transmittance is between 0.30 and 0.50.

11. The substrate of claim 1 wherein the coated substrate has a monolithic transmitted color characterized by the following color coordinates:

0.2<

x<

0.35, and 0.2<

y<

0.35, under 1931 CIE color standard.

12. The substrate of claim 1 wherein the transparent substrate is a glass pane that is part of a multiple-pane insulating glazing unit.

13. A transparent substrate bearing a solar control low-emissivity coating, the coating being a double-type low-emissivity coating comprising:

a first infrared-reflective film comprising silver and a second infrared-reflective film comprising silver, the first infrared-reflective film being closer to the substrate than the second infrared-reflective film;

a middle coat between the first and second infrared-reflective films, wherein the middle coat does not include any dielectric absorber film but rather consists essentially of transparent dielectric film;

a first dielectric absorber film between the substrate and the first infrared-reflective film; and

a second dielectric absorber film further from the substrate than the second infrared-reflective film.

14. The substrate of claim 13 wherein at least one of the first and second dielectric absorber films has a neutral absorption ratio of k_380<

λ

<

450 nm/k<sub>650<

λ

<

760 nm</sub> between 0.52 and 1.9.

15. The substrate of claim 13 wherein the first and second dielectric absorber films both comprise nitride film.

16. The substrate of claim 13 wherein at least one of the first and second dielectric absorber films comprises a compound nitride including silicon nitride mixed with another nitride.

17. The substrate of claim 13 wherein both of the first and second dielectric absorber films comprise a compound nitride including silicon nitride mixed with at least one other nitride selected from the group consisting of titanium nitride, niobium nitride, zirconium nitride, chromium nitride, and nickel-chrome nitride.

18. The substrate of claim 13 wherein at least one of the first and second dielectric absorber films comprises titanium nitride and/or niobium nitride.

19. The substrate of claim 13 wherein the first and second dielectric absorber films each have an optical thickness of less than 600 Å

.

20. The substrate of claim 13 wherein the coated substrate has a monolithic visible transmittance of between 0.30 and 0.50.

21. The substrate of claim 13 wherein the coated substrate has a monolithic transmitted color characterized by the following color coordinates:

0.2<

x<

0.35, and 0.2<

y<

0.35, under 1931 CIE color standard.

22. The substrate of claim 13 wherein a first suboxide barrier layer is directly over the first infrared-reflective film, and a second suboxide barrier layer is directly over the second infrared-reflective film, and wherein innermost portions of the first and second suboxide barrier layers are defined by suboxide film rather than metal film.

23. The substrate of claim 22 wherein the first and second suboxide barrier layers are directly beneath respective transparent dielectric layers.

24. The substrate of claim 13 wherein a titanium suboxide layer is directly over the second infrared-reflective layer, the second dielectric absorber film being directly over the titanium suboxide layer.

25. A transparent substrate bearing a solar control low-emissivity coating, the coating being a triple-type low-emissivity coating comprising, in sequence outwardly:

a first absorber film comprising nitride;

a first infrared-reflective film comprising silver;

a first spacer coat, wherein the first spacer coat does not include any dielectric absorber film but rather consists essentially of transparent dielectric film;

a second infrared-reflective film comprising silver;

a second spacer coat, wherein the second spacer coat does not include any dielectric absorber film but rather consists essentially of transparent dielectric film;

a third infrared-reflective film comprising silver; and

a second absorber film comprising nitride.

26. The substrate of claim 25 wherein at least one of the first and second absorber films has a neutral absorption ratio of k_380<

λ

<

450 nm/k<sub>650<

λ

<

760 nm</sub> between 0.52 and 1.9.

27. The substrate of claim 25 wherein at least one of the first and second absorber films comprises a compound nitride including silicon nitride mixed with another nitride.

28. The substrate of claim 25 wherein both of the first and second absorber films comprise a compound nitride including silicon nitride mixed with at least one other nitride selected from the group consisting of titanium nitride, niobium nitride, zirconium nitride, chromium nitride, and nickel-chrome nitride.

29. The substrate of claim 25 wherein the first and second nitride absorber films both comprise titanium nitride and/or niobium nitride.

30. The substrate of claim 25 wherein first, second, and third suboxide barrier layers are directly over the first, second, and third infrared-reflective layers, respectively, and wherein innermost portions of the three suboxide barrier layers are formed by suboxide film rather than metal film.

31. The substrate of claim 30 wherein the three suboxide barrier layers are directly beneath respective transparent dielectric layers.

32. The substrate of claim 25 wherein a titanium suboxide layer is directly over the third infrared-reflective layer, the second nitride absorber film being directly over the titanium suboxide layer.

33. The substrate of claim 25 wherein the coated substrate has a monolithic visible transmittance of between 0.30 and 0.50.

34. The substrate of claim 25 wherein the coated substrate has a monolithic transmitted color characterized by the following color coordinates:

0.2<

x<

0.35, and 0.2<

y<

0.35, under 1931 CIE color standard.

35. The substrate of claim 34 wherein the monolithic transmitted color is characterized by the following color coordinates:

0.25<

x<

0.33, and 0.25<

y<

0.33, under 1931 CIE color standard.