EXPOSURE METHOD, EXPOSURE APPARATUS AND DEVICE FABRICATING METHODS

• US 20090047607A1
• Filed: 03/30/2006
• Published: 02/19/2009
• Est. Priority Date: 03/31/2005
• Status: Abandoned Application

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Nagasaka, Hiroyuki, Hagiwara, Tsuneyuki
• Application Number:
  US11/910,224
• Publication Number:
  US 20090047607A1
• Time in Patent Office: Days
• US Class Current: 430/322
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/706 Aberration measurement

Abstract

A liquid immersion region (LR) is formed on a measuring member (65) by use of the liquid immersion mechanism (1), and measurement is performed by receiving measurement light through liquid (LQ) which forms the liquid immersion region (LR), in order to determine an exposure condition of a substrate (P). The substrate (P) is exposed by taking into account a difference between a pressure of the liquid (LQ) in the process of measurement and that in the process of exposure and a result of the measurement thus performed.

Claims

1. An exposure method for exposing a substrate by forming a liquid immersion region on the substrate by use of a liquid immersion mechanism and irradiating the substrate with exposure light through liquid of the liquid immersion region, comprising:

forming a liquid immersion region on a measuring member by use of the liquid immersion mechanism and performing measurement by receiving measurement light through liquid of the liquid immersion region, in order to determine an exposure condition of the substrate; and

exposing the substrate by taking into account a difference between a pressure of the liquid in the process of measurement and that in the process of exposure and a result of the measurement thus performed.

2. The exposure method according to claim 1, wherein the pressure difference of the liquid is caused by a difference in contact angles that a surface of the measuring member and a surface of the substrate make with the liquid, and

wherein the substrate is exposed in accordance with the contact angles that the surface of the measuring member and the surface of the substrate make with the liquid.

3. The exposure method according to claim 1, wherein the pressure difference of the liquid is caused by a difference between a moving speed of the measuring member in the process of measurement and a moving speed of the substrate in the process of exposure, and

wherein the substrate is exposed in accordance with the moving speed of the measuring member in the process of measurement and the moving speed of the substrate in the process of exposure.

4. The exposure method according to claim 1, wherein an imaging state of a pattern image projected on the substrate is adjusted in consideration of the pressure difference of the liquid and the measurement result, and the substrate is exposed with the adjusted pattern image.

5. The exposure method according to claim 4, wherein the exposure light is irradiated on the substrate through a projection optical system, and the imaging state of the pattern image is adjusted by adjusting the projection optical system.

6. The exposure method according to claim 1, wherein the exposure condition required to expose the substrate is determined based on the measurement result, and

wherein the exposure condition is corrected based on the pressure difference, and the substrate is exposed under the exposure condition thus corrected.

7. The exposure method according to claim 6, wherein a correlation between a correction value of the exposure condition and the pressure difference is determined in advance.

8. The exposure method according to claim 6, wherein the exposure condition comprises imaging characteristics of the projection optical system that projects the pattern image on the substrate.

9. The exposure method according to claim 1, wherein the measurement is performed while changing the pressure of the liquid, and

wherein the substrate is exposed based on the measurement result corresponding to the pressure of the liquid in the process of exposure.

10. The exposure method according to claim 1, wherein the liquid is held between an optical member through which the exposure light passes and the substrate in the process of exposure,

wherein the liquid is held between the optical member and the measuring member in the process of measurement, and

wherein the optical member is displaced by the pressure of the liquid.

11. The exposure method according to claim 1, wherein the pressures of the liquid in the process of measurement and in the process of exposure are respectively detected to obtain information on the pressure difference of the liquid.

12. A device fabricating method comprising:

using the exposure method according to claim 1.

13. An exposure apparatus for exposing a substrate by forming a liquid immersion region on the substrate and irradiating the substrate with exposure light through liquid in the liquid immersion region, comprising:

a liquid immersion mechanism that forms a liquid immersion region on an object;

a measuring device that performs measurement to determine an exposure condition of the substrate, the measuring device having a measuring member, the measuring device adapted to receive measurement light through liquid in the liquid immersion region formed on the measuring member by use of the liquid immersion mechanism; and

an exposure control unit that forms the liquid immersion region on the substrate by use of the liquid immersion mechanism and exposes the substrate in consideration of a measurement result obtained by the measuring device and a difference between a pressure of the liquid in the process of measurement and that in the process of exposure.

14. The exposure apparatus according to claim 13, wherein the exposure control unit corrects the exposure condition determined by the measurement result of the measuring device based on the pressure difference and exposes the substrate under the exposure condition thus corrected.

15. The exposure apparatus according to claim 14, further comprising a storage unit that stores a correlation between a correction value of the exposure condition and the pressure difference.

16. The exposure apparatus according to claim 13, further comprising a projection optical system through which the exposure light passes and an adjusting unit that adjusts imaging characteristics of the projection optical system, and

wherein the exposure control unit controls the adjusting unit, based on the measurement result obtained by the measuring device and the difference between the pressure of the liquid in the process of measurement and that in the process of exposure.

17. The exposure apparatus according to claim 13, further comprising a pressure sensor that detects the pressures of the liquid in the process of measurement and in the process of exposure to find the pressure difference of the liquid.

18. The exposure apparatus according to claim 13, further comprising a pressure regulating mechanism that regulates the pressure of the liquid, and wherein the measuring device performs the measurement while the pressure of the liquid is being changed by use of the pressure regulating mechanism.

19. A device fabricating method comprising:

using the exposure apparatus according to claim 13.