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Lithographic Apparatus and Device Manufacturing Method

  • US 20090051891A1
  • Filed: 10/30/2008
  • Published: 02/26/2009
  • Est. Priority Date: 12/27/2004
  • Status: Active Grant
First Claim
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1. A lithographic apparatus, comprising:

  • an illumination system that supplies a beam of radiation;

    an array of individually controllable elements that pattern the beam;

    a projection system that projects the patterned beam onto a target portion of a substrate;

    a movement system that causes relative movement between the substrate and the projection system; and

    a detection system arranged to detect individual, indiscrete alignment marks distributed in a pattern over an area of the substrate so as to determine a relative position of the substrate to the projection system.

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