Matrix type display device and manufacturing method thereof

• US 20090053396A1
• Filed: 08/27/2008
• Published: 02/26/2009
• Est. Priority Date: 09/19/1996
• Status: Active Grant

• Current Assignee: Seiko Epson Corporation (Seiko Group)
• Original Assignee: Seiko Epson Corporation (Seiko Group)
• Inventors: Kimura, Mutsumi, Kiguchi, Hiroshi
• Granted Patent: US 8,431,182 B2
• Time in Patent Office: Days
• US Class Current: 427/66
• CPC Class Codes: G02F 1/133377 Cells with plural compartments or having plurality of liquid crystal microcells partitioned by walls, e.g. one microcell per pixel
• CPC Class Codes: G02F 1/1341 Filling or closing of cells
• CPC Class Codes: G02F 1/13613 the semiconductor element being formed on a first substrate and thereafter transferred to the final cell substrate
• CPC Class Codes: G02F 1/136286 Wiring, e.g. gate line, drain line
• CPC Class Codes: H10K 2102/351 Thickness
• CPC Class Codes: H10K 50/81 Anodes
• CPC Class Codes: H10K 59/12 Active-matrix OLED [AMOLED] displays
• CPC Class Codes: H10K 59/1201 Manufacture or treatment
• CPC Class Codes: H10K 59/122 Pixel-defining structures or layers, e.g. banks
• CPC Class Codes: H10K 59/131 Interconnections, e.g. wiring lines or terminals
• CPC Class Codes: H10K 59/17 Passive-matrix OLED displays
• CPC Class Codes: H10K 59/173 comprising banks or shadow masks
• CPC Class Codes: H10K 71/00 Manufacture or treatment specially adapted for the organic devices covered by this subclass
• CPC Class Codes: H10K 71/13 using printing techniques, e.g. ink-jet printing or screen printing
• CPC Class Codes: H10K 71/50 Forming devices by joining two substrates together, e.g. lamination techniques

Abstract

An object of the invention is to improve patterning accuracy while maintaining low cost, high throughput and a high degree of freedom of an optical material in a matrix type display device and a manufacturing method thereof.

In order to achieve the object, a difference in height, a desired distribution of liquid repellency and affinity to liquid, or a desired potential distribution is formed by utilizing first bus lines in a passive matrix type display device or utilizing scanning lines, signal lines, common current supply lines, pixel electrodes, an interlevel insulation film, or a light shielding layer in an active matrix type display device. A liquid optical material is selectively coated at predetermined positions by utilizing the difference in height, the desired distribution of liquid repellency and affinity to liquid, or the desired potential distribution.

Claims

1. A method of manufacturing an electro-luminescent device, the method:

comprising;

forming a pixel electrode on a substrate;

forming a solid insulation film around the pixel electrode, the solid insulation film having a surface with a higher liquid repellency than a liquid repellency at a surface of the pixel electrode; and

applying one of an optical material and a liquid precursor over the pixel electrode.

2. A method of manufacturing an electro-luminescent device according to claim 1, wherein the step of applying includes covering an exposed portion of the pixel electrode with the one of an optical material and a liquid precursor.

3. A method of manufacturing an electro-luminescent device according to claim 2, wherein the step of forming the solid insulation film includes at least partially covering the pixel electrode with the solid insulation film.

4. A method of manufacturing an electro-luminescent device according to claim 1, wherein the step of forming the solid insulation film includes at least partially covering the pixel electrode with the solid insulation film.

5. A method of manufacturing an electro-luminescent device according to claim 1, the liquid repellency being water repellency.