METHOD FOR SUCCESSIVELY FUNCTIONALIZING A SUBSTRATE AND MICROSTRUCTURE IS OBTAINABLE BY SAID METHOD

• US 20090053481A1
• Filed: 08/02/2006
• Published: 02/26/2009
• Est. Priority Date: 08/02/2005
• Status: Abandoned Application

• Current Assignee: Commissariat a L'Energie Atomique (AES Corporation)
• Original Assignee: Commissariat a L'Energie Atomique (AES Corporation)
• Inventors: Delattre, Cyril, Delapierre, Guillaume
• Application Number:
  US11/997,477
• Publication Number:
  US 20090053481A1
• Time in Patent Office: Days
• US Class Current: 428/195.100
• CPC Class Codes: B01J 19/0046 Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays synthesis methods per se C40B50/00
• CPC Class Codes: B01J 2219/00387 Applications using probes
• CPC Class Codes: B01J 2219/00529 DNA chips
• CPC Class Codes: B01J 2219/00608 DNA chips
• CPC Class Codes: B01J 2219/00612 the surface being inorganic
• CPC Class Codes: B01J 2219/00617 by chemical means
• CPC Class Codes: B01J 2219/00619 using hydrophilic or hydrophobic regions
• CPC Class Codes: B01J 2219/00626 Covalent
• CPC Class Codes: B01J 2219/00637 by coating it with another layer
• CPC Class Codes: B01J 2219/00659 Two-dimensional arrays
• CPC Class Codes: B01J 2219/00722 Nucleotides
• CPC Class Codes: Y10T 428/24802 Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Abstract

A method for successively functionalizing a substrate whose surface is provided with at least two areas (1, 2) made up of different materials, with at least one chemical substrate, characterized in that the functionalization is carried out without masking and consists (a) in functionalizing a first area (1) without masking the second area (2) or possible successive areas by transforming the substrate with the aid of a chemical substance X¹, wherein the first area material reactivity is greater with respect to the reactivity of the substance X¹ than the reactivity of the other possible successive areas with respect thereto, and (b1) in treating the second area (2) or the other possible successive areas with a chemical substance Y¹ for removing reaction products deposited on said areas during the functionalization from the areas of the substance X¹ and/or the possible successive areas without damaging the functionalized surface of the first area.

Claims

1. A method for successively functionalizing a substrate, whose surface is provided with at least two areas (1, 2) made up of different materials, with at least one chemical substance, comprising the steps of:

(a) functionalizing a first area (1) without masking the second area (2) or the possible successive areas by transforming the substrate with a chemical substance X¹, and forming a covalent bond between the chemical substance X¹ and the first-area material (1), wherein the reactivity of the first-area material is greater with respect to the substance X¹ than the reactivity of the materials of the possible successive areas with respect thereto, and forming a covalent bond between the chemical substance X¹ and the first-area material (1), and

(b1) treating the second area (2) and/or the possible successive areas with a chemical substance Y¹ in order to clean from these areas the substance X¹ and/or its reaction products, which have been deposited on these areas during the functionalization of the first area (1), without damaging the functionalized surface of the first area (1).

2. The method as claimed in claim 1, characterized in that the following step is also carried out:

(c) functionalizing a second area (2) without masking the successive areas by transforming the substrate with a chemical substance X² different than X¹, wherein the reactivity of the second-area material is greater with respect to the substance X² than the reactivity of the other materials, and forming a bond between the chemical substance X² and the second-area material (2); and

eliminating from the third area or from the possible successive areas, when these areas are present.

3. The method as claimed in claim 1, characterized in that, before the functionalization, the following step is carried out:

(b2) chemically or physically activating the second area (2) and the possible successive areas with a view to functionalization, by treating with a chemical substance Y different than the chemical substances X¹ and X².

4. The method as claimed in claim 1, characterized in that steps (b1), (b2) and/or (c) are repeated one or more times, it being possible to use, in steps (a) and (c), chemical substances X different than X¹ and X² and, in steps (b1) and/or (b2), chemical substances Y different than Y¹ and than Y².

5. The method as claimed in claim 1, characterized in that Y¹ is identical to Y².

6. The method as claimed in claim 1, characterized in that step (b1) and/or step (b2) is carried out in an acidic or basic medium.

7. The method as claimed in claim 1, characterized in that there is at least one area (1) made up of conducting or semiconducting materials that can react thermally, photochemically or mechanochemically with chemical substances X¹, X² or X, the molecules of which possess a chemical functionality reactive with respect to these materials, in order to form a chemical bond, in particular a covalent bond.

8. The method as claimed in claim 7, characterized in that the conducting or semiconducting materials are selected from those of the group comprising silicon, crystalline or amorphous carbon and metals.

9. The method as claimed in claim 1, characterized in that there is at least one area (2) made up of a material selected from those of the group comprising metal or semimetallic nitrides or oxides, or a mixture of these materials, and polymers.

10. The method as claimed in claim 1, characterized in that the chemical substances Y¹, Y² or Y are chosen from those of the group comprising HF, H₂SO₄, H₂O₂, HNO₃, and mixtures thereof, or strong bases.

11. The method as claimed in claim 1, characterized in that the functionalized areas are modified by means of chemical bonds or of a physical treatment.

12. A microstructure containing areas which consist of various materials, wherein at least one area is functionalized by covalent bonding, that can be carried out by a method as claimed in claim 1.