Exposure Apparatus

• US 20090059188A1
• Filed: 09/24/2008
• Published: 03/05/2009
• Est. Priority Date: 08/30/2005
• Status: Active Grant

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Aichi, Shintaro
• Granted Patent: US 8,184,261 B2
• Time in Patent Office: Days
• US Class Current: 355/27
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/7075 Handling workpieces outside exposure position, e.g. SMIF box
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Abstract

An exposure apparatus includes an alignment station where an alignment measurement process is executed, an exposure station where an exposure process is executed, and two stages which can be swapped between the alignment station and the exposure station. A first blowing unit blows temperature-adjusted gas toward the alignment station, and a second blowing unit blows temperature-adjusted gas toward the exposure station. The directions in which the first blowing unit and the second blowing unit blow the gases are substantially perpendicular to a direction along which the alignment station and the exposure station are arranged.

Claims

1-14. -14. (canceled)

15. An exposure apparatus which includes an alignment station where an alignment measurement process is executed, an exposure station where an exposure process is executed, and two stages which can be swapped between said alignment station and said exposure station, the apparatus comprising:

a first blowing unit which blows temperature-adjusted gas toward the alignment station; and

a second blowing unit which blows temperature-adjusted gas toward the exposure station,

wherein directions in which said first blowing unit and said second blowing unit blow the gases are substantially perpendicular to a direction along which the alignment station and the exposure station are arranged.

16. The apparatus according to claim 15, further comprising:

a first temperature sensor which measures a temperature of the gas blown from said first blowing unit;

a second temperature sensor which measures a temperature of the gas blown from said second blowing unit;

a first temperature adjusting unit which supplies, to said first blowing unit, the gas that is temperature-adjusted in accordance with a temperature measurement result sent from said first temperature sensor; and

a second temperature adjusting unit which supplies, to said second blowing unit, the gas that is temperature-adjusted in accordance with a temperature measurement result sent from said second temperature sensor.

17. The apparatus according to claim 15, wherein the directions in which said first blowing unit and said second blowing unit blow the gases are a substantially horizontal direction.

18. The apparatus according to claim 15, wherein the directions in which said first blowing unit and said second blowing unit blow the gases are a substantially vertical direction.

19. The apparatus according to claim 15, further comprising an air curtain unit which forms an air curtain between said alignment station and said exposure station.

20. A device manufacturing method comprising steps of:

(a) causing an exposure apparatus defined in claim 15 to form a latent image pattern on a photosensitive agent applied to a substrate; and

(b) developing the latent image pattern,

wherein the exposure apparatus includes;

(i) an alignment station where an alignment measurement process is executed;

(ii) an exposure station where an exposure process is executed;

(iii) two stages which can be swapped between the alignment station and the exposure station;

(iv) a first blowing unit which blows temperature-adjusted gas toward the alignment station; and

(v) a second blowing unit which blows temperature-adjusted gas toward the exposure station,

wherein directions in which the first blowing unit and the second blowing unit blow the gases are substantially perpendicular to a direction along which the alignment station and the exposure station are arranged.

21. An exposure apparatus which includes an alignment station where an alignment measurement process is executed, an exposure station where an exposure process is executed, and two stages which can be swapped between said alignment station and said exposure station, the apparatus comprising:

a first blowing unit which blows temperature-adjusted gas toward the alignment station;

a second blowing unit which blows temperature-adjusted gas toward the exposure station; and

an air curtain unit which forms an air curtain between the alignment station and the exposure station.

22. An apparatus according to claim 21, wherein said air curtain unit includes a third blowing unit which is arranged between said alignment station and said exposure station and blows gas so as to form an air curtain to partition said alignment station and said exposure station.

23. The apparatus according to claim 22, wherein said air curtain unit further includes a third temperature adjusting unit which supplies temperature-adjusted gas to said third blowing unit.

24. The apparatus according to claim 22, wherein said air curtain unit further includes a suction unit which draws gas by suction.

25. The apparatus according to claim 22, wherein the said third blowing unit ejects gas substantially vertically downward to form a downflow.

26. A device manufacturing method comprising steps of:

(a) causing an exposure apparatus defined in claim 21 to form a latent image pattern on a photosensitive agent applied to a substrate; and

(b) developing the latent image pattern,

wherein the exposure apparatus includes;

(i) an alignment station where an alignment measurement process is executed;

(ii) an exposure station where an exposure process is executed;

(iii) two stages which can be swapped between the alignment station and the exposure station;

(iv) a first blowing unit which blows temperature-adjusted gas toward the alignment station;

(v) a second blowing unit which blows temperature-adjusted gas toward the exposure station; and

(vi) an air curtain unit which forms an air curtain between the alignment station and the exposure station.

27. An exposure apparatus which includes an alignment station where an alignment measurement process is executed, an exposure station where an exposure process is executed, and two stages which can be swapped between said alignment station and said exposure station, the apparatus comprising:

an air curtain unit which forms an air curtain between said alignment station and said exposure station.

28. A device manufacturing method comprising steps of:

(a) causing an exposure apparatus defined in claim 27 to form a latent image pattern on a photosensitive agent applied to a substrate; and

(b) developing the latent image pattern,

wherein the exposure apparatus which includes;

(i) an alignment station where an alignment measurement process is executed;

(ii) an exposure station where an exposure process is executed; and

(iii) two stages which can be swapped between the alignment station and the exposure station; and

(iv) an air curtain which forms an air curtain between the alignment station and the exposure station.