METHOD AND DEVICE FOR PRODUCING AND PROCESSING LAYERS OF SUBSTRATES UNDER A DEFINED PROCESSING ATMOSPHERE
First Claim
1. A method for producing a processing atmosphere for producing and processing layers on a substrate, in which in a coating chamber processing gas is supplied and exhausted in a defined manner, wherein a gas flow is created by exhausting processing gas in the coating chamber at least at a side of the substrate at which a coating source is arranged, via a gas channel extending perpendicular in reference to a direction of transportation of the substrate through the coating chamber, said gas flow being aligned away from the substrate and being provided with a lateral extension in a width of the substrate as well as perpendicular in reference to the direction of transportation.
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Abstract
A method is provided for producing a processing atmosphere for coating substrates, with this method primarily being used in CVD-processes for precipitating an individual layer or a system of individual layers under defined processing atmospheres, in which processing gas is supplied to a coating chamber in a defined manner and exhausted. Via the method and related devices, a variable processing atmosphere is adjustable inside the coating chamber in a flexible, reliable and homogenous manner, and requiring a reduced maintenance and energy expense, even when the substrate is heated. The processing gas is created by at least one gas channel extending perpendicular in reference to the substrate by way of supplying gas flow or exhausting, with a lateral extension being equivalent to the width of the substrate.
28 Citations
26 Claims
- 1. A method for producing a processing atmosphere for producing and processing layers on a substrate, in which in a coating chamber processing gas is supplied and exhausted in a defined manner, wherein a gas flow is created by exhausting processing gas in the coating chamber at least at a side of the substrate at which a coating source is arranged, via a gas channel extending perpendicular in reference to a direction of transportation of the substrate through the coating chamber, said gas flow being aligned away from the substrate and being provided with a lateral extension in a width of the substrate as well as perpendicular in reference to the direction of transportation.
- 4. A method for producing a processing atmosphere for the creation and processing of layers on a substrate, in which a processing gas is supplied to a coating chamber and exhausted in a defined manner, wherein at least at a side of the substrate at which a coating source is arranged, a gas flow is created by a supply of processing gas via a gas channel extending perpendicular in reference to a direction of transportation of the substrate and provided with at least one opening, said gas flow being aligned towards the substrate and having a lateral extension in a width of the substrate as well perpendicular in reference to the direction of transportation and the gas channel as well as the processing gas to be supplied are heated via a heating element.
- 13. A coating chamber for producing and processing layers on a substrate via coating methods, through which, in a substrate level, a substrate is moved, having a coating source and a device for supplying and a device for exhausting processing gas from the coating chamber and having a gas channel which extends perpendicular in reference to a direction of transportation of the substrate over the width of the substrate and at least one opening, so that a gas flow is created between the substrate and the gas channel and distributed over the width of the substrate, wherein the gas channel optionally can be connected to the device for supplying processing gas and the device for exhausting processing gas.
- 20. A heating element in a coating chamber having a heat radiating source mounted at a longitudinal fastener, wherein the fastener is embodied as a gas channel having a hollow body, provided with at least one opening for gas penetration and which optionally can be connected to a processing gas source or a vacuum pump.
Specification