Exposure method and apparatus, maintenance method, and device manufacturing method
First Claim
1. An exposure method for exposing a substrate with an exposure light via an optical member and a liquid, the exposure method comprising:
- a first step of storing first observation information obtained by optically observing a state of at least a part of a detection objective portion of a liquid contact portion which comes into contact with the liquid in a predetermined operation;
a second step of obtaining second observation information by optically observing a state of the detection objective portion after the predetermined operation; and
a third step of comparing the first observation information and the second observation information to judge whether abnormality of the detection objective portion is present or absent.
1 Assignment
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Accused Products
Abstract
An exposure method for exposing a substrate with an exposure light via an projection optical system and a liquid includes: a first step of optically observing a liquid contact portion which comes into contact with the liquid and storing first image data obtained by the optical observation; a second step of optically observing the liquid contact portion after the liquid contact portion came into contact with the liquid, for example, after the liquid immersion exposure and obtaining second image data obtained by the optical observation; and a third step of comparing the first image data and the second image data to judge whether abnormality of observation objective portion is present or absent. It is possible to efficiently judge whether or not the abnormality of the liquid-contact portion, of the exposure apparatus which performs the exposure by the immersion method, is present or absent.
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Citations
96 Claims
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1. An exposure method for exposing a substrate with an exposure light via an optical member and a liquid, the exposure method comprising:
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a first step of storing first observation information obtained by optically observing a state of at least a part of a detection objective portion of a liquid contact portion which comes into contact with the liquid in a predetermined operation; a second step of obtaining second observation information by optically observing a state of the detection objective portion after the predetermined operation; and a third step of comparing the first observation information and the second observation information to judge whether abnormality of the detection objective portion is present or absent. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 74)
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15. An exposure method for exposing a substrate with an exposure light via an optical member and a liquid, the exposure method comprising:
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detecting information about a state of a liquid contact portion which comes into contact with the liquid in a predetermined operation; and detecting information about abnormality of the liquid contact portion based on the detected information about the state and reference information about a state of the liquid contact portion before the predetermined operation. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 91)
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27. An exposure apparatus which exposes a substrate with an exposure light via an optical member and a liquid, the exposure apparatus comprising:
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an optical device which optically observes a state of at least a part of a detection objective portion of a liquid contact portion which comes into contact with the liquid; a storage device which stores observation information obtained by the optical device; and a controller which compares a plurality of pieces of the observation information obtained by observing the detection objective portion a plurality of times by the optical device to judge whether abnormality of the detection objective portion is present or absent. - View Dependent Claims (28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 86)
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40. An exposure apparatus which exposes a substrate with an exposure light via an optical member and a liquid, the exposure apparatus comprising:
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an optical device which detects information about a state of a liquid contact portion which comes into contact with the liquid in a predetermined operation; and a controller which detects information about abnormality of the liquid contact portion based on the detected information about the state and reference information about a state of the liquid contact portion before the predetermined operation. - View Dependent Claims (41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 94)
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53. A maintenance method for an exposure apparatus which exposes a substrate with an exposure light via an optical member and a liquid, the maintenance method comprising:
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detecting information about a state of a liquid contact portion which comes into contact with the liquid in a predetermined operation; and detecting information about abnormality of the liquid contact portion based on the detected information about the state and reference information about a state of the liquid contact portion before the predetermined operation. - View Dependent Claims (54, 55, 56, 57, 58)
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59. An exposure method for exposing a substrate with an exposure light through a liquid, the exposure method comprising:
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a first step of supplying the liquid to only a part of an area on the substrate; a second step of recovering at least a part of the liquid supplied in the first step and inspecting a state of the recovered liquid; a third step of inspecting a state of a film of the substrate; and a fourth step of judging whether abnormality is present or absent in the substrate based on at least one of inspection results obtained in the second step and the third step. - View Dependent Claims (60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 92)
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70. An exposure method for exposing a substrate with an exposure light via an optical member and a liquid, the exposure method comprising:
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filling a space between the optical member and an object with the liquid to form a liquid immersion space and recovering the liquid in the liquid immersion space; detecting information about the recovered liquid; and detecting information about abnormality of a liquid contact portion which comes into contact with the liquid, based on the detected information about the recovered liquid. - View Dependent Claims (71, 72, 73, 93)
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75. An exposure apparatus which exposes a substrate with an exposure light through a liquid, the exposure apparatus comprising:
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a liquid supply system which supplies the liquid to only a part of an area on the substrate; a first detector which detects a state of a liquid obtained by recovering the liquid supplied by the liquid supply system; a second detector which detects a state of a film of the substrate; and a controller which judges whether abnormality of the substrate is present or absent based on at least one of detection results obtained by the first detector and the second detector. - View Dependent Claims (76, 77, 78, 79, 80, 95)
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81. An exposure apparatus which exposes a substrate with an exposure light via an optical member and a liquid, the exposure apparatus comprising:
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a liquid immersion mechanism which forms a liquid immersion space by filling a space between the optical member and an object with the liquid and which recovers the liquid in the liquid immersion space; a detecting device which detects information about the recovered liquid; and a controller which detects information about abnormality of a liquid contact portion which comes into contact with the liquid, based on the detected information about the recovered liquid. - View Dependent Claims (82, 83, 84, 85, 96)
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87. An exposure method for exposing a substrate with an exposure light via an optical member and a liquid, the exposure method comprising:
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detecting information about a state of a liquid contact portion which comes into contact with the liquid in a predetermined operation; and detecting information about abnormality of the liquid contact portion based on the detected information about the state. - View Dependent Claims (88)
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89. An exposure apparatus which exposes a substrate with an exposure light via an optical member and a liquid, the exposure apparatus comprising:
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an optical device which detects information about a state of a liquid contact portion which comes into contact with the liquid in a predetermined operation; and a controller which detects information about abnormality of the liquid contact portion, based on the detected information about the state. - View Dependent Claims (90)
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Specification