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CLEANING OF PLASMA CHAMBER WALLS USING NOBLE GAS CLEANING STEP

  • US 20090065025A1
  • Filed: 09/05/2008
  • Published: 03/12/2009
  • Est. Priority Date: 09/07/2007
  • Status: Active Grant
First Claim
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1. A method for removing water residues from a surface of a material in a plasma chamber, the method comprising:

  • exposing a surface of a material in a plasma chamber to a noble gas plasma, wherein the noble gas plasma emits at least one of extreme ultra violet and vacuum ultra violet photons having sufficient energy to cause photolysis of water molecules adsorbed to the surface of the material, so as to release at least one of oxygen radicals, hydrogen radicals, and hydroxyl radicals; and

    removing the radicals from the reaction chamber, such that re-deposition of water residues on the surface of the material is avoided.

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