ELECTROCHEMICAL SYSTEM ON A PLASTIC SUBSTRATE

• US 20090067031A1
• Filed: 11/14/2006
• Published: 03/12/2009
• Est. Priority Date: 11/16/2005
• Status: Active Grant

• Current Assignee: Saint-Gobain Glass France (Compagnie De Saint-Gobain)
• Original Assignee: Saint - Gobain Glass France
• Inventors: Rigal, Francoise, Mathey, Gregoire, Piroux, Fabienne, Valentin, Emmanuel, Dubrenat, Samuel, Chaussade, Pierre
• Granted Patent: US 7,777,933 B2
• Time in Patent Office: Days
• US Class Current: 359/265
• CPC Class Codes: G02F 1/1503 caused by oxidation-reduction reactions in organic liquid solutions, e.g. viologen solutions
• CPC Class Codes: G02F 1/1524 Transition metal compounds
• CPC Class Codes: G02F 1/15245 based on iridium oxide or hydroxide

Abstract

Electrochemical system comprising at least one substrate of organic nature, at least one electronically conductive layer and at least one active species, characterized in that it includes at least one organic layer lying between the electronically conductive layer and the substrate.

Claims

1. An electrochemical system comprising at least one substrate of organic nature, at least one electronically conductive layer and at least one active species, wherein it includes at least one organic layer lying between the electronically conductive layer and the substrate, a barrier layer, based on silicon nitride, oxide or oxynitride, or based on aluminum nitride or oxide or oxynitride or on a mixture of at least two of these compounds (mixed Si/Al nitrides or oxynitrides) said barrier layer interposed between the varnish layer and the electronically conductive layer.

2. The electrochemical system as claimed in claim 1, wherein the substrate comprises PMMA.

3. The system as claimed in claim 1, wherein the substrate is drawn PMMA.

4. The system as claimed in claim 1, wherein the organic layer is a polysilaxane-based varnish.

5. The system as claimed in claim 4, wherein the organic layer has a thickness between 0.5 μ

m and 10 μ

m.

6. The system as claimed in claim 1, wherein the electronically conductive layer is metallic or a TCO (transparent conductive oxide) made of ITO, SnO₂:

F, ZnO;

Al, or a multilayer of TCO/metal/TCO, this metal selected from the group consisting of silver, gold, platinum and copper, or a multilayer of NiCr/metal/NiCr, the metal also selected from the group consisting of silver, gold, platinum and copper.

7. The system as claimed in claim 6, wherein the barrier layer has a thickness from 50 nm to 500 nm.

8. The system as claimed in claim 1, wherein the active layer AC comprises in one and the same medium, an anodic-coloration and a cathodic-coloration electroactive material, at least one solvent, optionally at least one polymer and optionally at least one ionic salt acting, if necessary, as an electrolyte.

9. The system as claimed in claim 8, wherein the anodic-coloration species is a phenazine derivative selected from the group consisting of 5,10-dihydrophenazine, 1,4-phenylenediamine, benzidine, metallocene, phenothiazine and carbazole.

10. The system as claimed in claim 8, wherein the cathodic-coloration species is a viologen (a bipyridinium salt) selected from the group consisting of methyl viologen tetrafluoroborates, octyl viologen tetrafluoroborates, or quinone or polythiophene.

11. The system as claimed in claim 8, wherein the solvent is selected from the group consisting of dimethyl sulfoxide, N,N-dimethylformamide, propylene carbonate, ethylene carbonate, N-methylpyrolidinone, γ

-butyrolactone, ionic liquids, ethylene glycols, alcohols, ketones and nitriles.

12. The system as claimed in claim 8, wherein the polymer is selected from the group consisting of polyether, polyester, polyamide, polyimide, polycarbonate, polymethacrylate, polyacrylate, polyacetate, polysilane, polysiloxane and cellulose.

13. The system as claimed in claim 8, wherein the ionic salt is selected from the group consisting of lithium perchlorate, trifluoromethanesulfonate (triflate) salts, trifluoromethanesulfonylimide salts, ammonium salts or ionic liquids.

14. The system as claimed in claim 8, wherein the layer AC has a thickness from 50 μ

m to 500 μ

m.

15. The system as claimed in claim 1, wherein the active species is in the form of an electrochemically active layer comprising at least one of the following compounds:

tungsten (W) oxide, niobium (Nb) oxide, tin (Sn) oxide, bismuth (Bi) oxide, vanadium (V) oxide, nickel (Ni) oxide, iridium (Ir) oxide, antimony (Sb) oxide or tantalum (Ta) oxide, by itself or as a mixture, and optionally including an additional metal such as titanium, tantalum or rhenium.

16. The system as claimed in claim 1, wherein it further comprises a layer having an electrolytic function, selected from the group consisting of silicon nitride (Si₃N₄), molybdenum oxide (MoO₃), tantalum oxide (Ta₂O₅), antimony oxide (Sb₂O₅), nickel oxide (NiO_x), tin oxide (SnO₂), zirconium oxide (ZrO₂), aluminum oxide (Al₂O₃), silicon oxide (SiO₂), niobium oxide (Nb₂O₅), chromium oxide (Cr₂O₃), cobalt oxide (Co₃O₄), titanium oxide (TiO₂), zinc oxide (ZnO) optionally alloyed with aluminum, tin zinc oxide (SnZnO_x), vanadium oxide (V₂O₅), at least one of these oxides being optionally hydrogenated or nitrided, the electrochemically active material and the materials having an electrolytic function are included in one and the same medium.

17. An electrochromic glazing, wherein it comprises the electrochemical system as claimed in claim 1, having in particular a variable light and/or energy transmission and/or reflection, with the transparent or partially transparent substrate or at least some of the transparent or partially transparent substrates, made of a plastic, preferably mounted as multiple and/or laminated glazing or as double glazing.

18. An electrochromic glazing, comprising the electrochemical system as claimed in claim 1, wherein it is combined with at least one other layer suitable for providing said glazing with an additional functionality (solar-control, low-E, hydrophobic, hydrophilic or antireflection functionality).

19. A process for manufacturing the electrochemical device as claimed in claim 1, wherein at least one of the layers of the electrochemical system is deposited by a sputtering vacuum technique, optionally magnetron or magnetically enhanced sputtering, by thermal evaporation or electron-beam evaporation, by laser ablation, by CVD, optionally plasma-enhanced or microwave-enhanced CVD, or by an atmospheric-pressure technique, especially by the deposition of layers by sol-gel synthesis, particularly dip coating, spray coating or laminar flow coating.

20. A method of coating a support, comprising applying the glazing as claimed in claim 17 to an architectural support, an automotive support, an industrial or public transport vehicle support, a railroad vehicle support, a ship and aircraft support, particularly as windows, rear-view mirrors and other mirrors.

21. The system as claimed in claim 4, wherein the organic layer has a thickness from 1 μ

m to 3 μ

m.

22. The system as claimed in claim 6, wherein the barrier layer has a thickness from 100 nm to 300 nm.

23. The system as claimed in claim 8, wherein the layer AC has a thickness from 150 μ

m to 300 μ

m.