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ATOMIC LAYER DEPOSITION CHAMBER AND COMPONENTS

  • US 20090084317A1
  • Filed: 09/28/2007
  • Published: 04/02/2009
  • Est. Priority Date: 09/28/2007
  • Status: Abandoned Application
First Claim
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1. An atomic layer deposition chamber comprising:

  • (a) a sidewall surrounding a bottom wall;

    (b) a substrate support extending through the bottom wall;

    (c) a gas distributor comprising;

    (i) a central cap comprising at least one gas inlet, a gas outlet, and a conical passageway between the gas inlet and gas outlet; and

    (ii) a ceiling plate comprising a first conical aperture that receives a process gas from the gas outlet of the central cap, a second conical aperture extending radially outwardly from the first conical aperture, and a peripheral ledge that rests on the sidewall of the chamber; and

    (d) an exhaust port to exhaust the process gas from the process zone.

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