ATOMIC LAYER DEPOSITION CHAMBER AND COMPONENTS
First Claim
Patent Images
1. An atomic layer deposition chamber comprising:
- (a) a sidewall surrounding a bottom wall;
(b) a substrate support extending through the bottom wall;
(c) a gas distributor comprising;
(i) a central cap comprising at least one gas inlet, a gas outlet, and a conical passageway between the gas inlet and gas outlet; and
(ii) a ceiling plate comprising a first conical aperture that receives a process gas from the gas outlet of the central cap, a second conical aperture extending radially outwardly from the first conical aperture, and a peripheral ledge that rests on the sidewall of the chamber; and
(d) an exhaust port to exhaust the process gas from the process zone.
1 Assignment
0 Petitions
Accused Products
Abstract
An atomic layer deposition chamber comprises a gas distributor comprising a central cap having a conical passageway between a gas inlet and gas outlet. The gas distributor also has a ceiling plate comprising first and second conical apertures that are connected. The first conical aperture receives a process gas from the gas outlet of the central cap. The second conical aperture extends radially outwardly from the first conical aperture. The gas distributor also has a peripheral ledge that rests on a sidewall of the chamber.
600 Citations
36 Claims
-
1. An atomic layer deposition chamber comprising:
-
(a) a sidewall surrounding a bottom wall; (b) a substrate support extending through the bottom wall; (c) a gas distributor comprising; (i) a central cap comprising at least one gas inlet, a gas outlet, and a conical passageway between the gas inlet and gas outlet; and (ii) a ceiling plate comprising a first conical aperture that receives a process gas from the gas outlet of the central cap, a second conical aperture extending radially outwardly from the first conical aperture, and a peripheral ledge that rests on the sidewall of the chamber; and (d) an exhaust port to exhaust the process gas from the process zone. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
-
-
15. An atomic layer deposition chamber comprising:
-
(a) a sidewall around a process zone; (b) a substrate support capable of receiving a substrate in the process zone; (c) a chamber liner encircling the process zone, the chamber liner comprising (i) a first annular band having a first diameter and a first slot extending therethrough; (ii) a second annular band having a second diameter that is sized larger than diameter of the first annular band, and having a second slot aligned to the first slot of the first annular band; and (iii) a radial flange joining the first and second annular bands; (d) a gas distributor to introduce a process gas into the process zone; and (e) an exhaust to exhaust the process gas. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22)
-
-
23. An exhaust shield assembly for an atomic layer deposition chamber, the assembly comprising:
-
(a) an inner shield comprising an enclosed rectangular band having a perimeter, and a planar frame extending perpendicularly beyond the perimeter of the rectangular band; (b) a pocket shield comprising (i) a tubular encasing having a top end, an inner rectangular cutout that fits the rectangular band of the inner shield, and an outer circular cutout, and (ii) a cover to cover the top end of the tubular encasing; and (c) an outer shield comprising (i) first and second cylinders that are joined to one another, the first cylinder sized larger than the second cylinder, and (ii) a planar member attached to the second cylinder and extending perpendicularly beyond the second cylinder. - View Dependent Claims (24, 25, 26, 27, 28, 29)
-
-
30. A lid assembly for a substrate processing chamber, the lid assembly comprising:
-
(a) a chamber lid having a bottom surface; (b) a showerhead that fits in the bottom surface of the chamber lid, the showerhead comprising a central hole; and (c) a gas distributor insert to fit into the central hole of the showerhead, the insert having a plurality of radial slots that are spaced apart from one another. - View Dependent Claims (31, 32, 33, 34, 35, 36)
-
Specification