METHOD FOR DIRECTIONAL DEPOSITION USING A GAS CLUSTER ION BEAM
First Claim
1. A method for depositing material on a substrate having a plurality of surfaces including one or more first surfaces lying substantially parallel to a first plane and one or more second surfaces lying substantially perpendicular to said first plane, the method comprising:
- directing a gas cluster ion beam (GCIB) formed from a source of precursor to a thin film toward said substrate with a direction of incidence; and
orienting said substrate relative to said direction of incidence such that said first plane is substantially perpendicular to said direction of incidence to directionally deposit said thin film on said one or more first surfaces oriented substantially perpendicular to said direction of incidence, while substantially avoiding deposition of said thin film on said one or more second surfaces oriented substantially parallel to said direction of incidence.
2 Assignments
0 Petitions
Accused Products
Abstract
A method for depositing material on a substrate is described. The method comprises directionally depositing a thin film on one or more surfaces of a substrate using a gas cluster ion beam (GCIB) formed from a source of precursor to the thin film, wherein the deposition occurs on surfaces oriented substantially perpendicular to the direction of incidence of the GCIB, and deposition is substantially avoided on surfaces oriented substantially parallel to the direction of incidence.
-
Citations
19 Claims
-
1. A method for depositing material on a substrate having a plurality of surfaces including one or more first surfaces lying substantially parallel to a first plane and one or more second surfaces lying substantially perpendicular to said first plane, the method comprising:
-
directing a gas cluster ion beam (GCIB) formed from a source of precursor to a thin film toward said substrate with a direction of incidence; and orienting said substrate relative to said direction of incidence such that said first plane is substantially perpendicular to said direction of incidence to directionally deposit said thin film on said one or more first surfaces oriented substantially perpendicular to said direction of incidence, while substantially avoiding deposition of said thin film on said one or more second surfaces oriented substantially parallel to said direction of incidence. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
-
Specification