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METHOD FOR DIRECTIONAL DEPOSITION USING A GAS CLUSTER ION BEAM

  • US 20090087579A1
  • Filed: 09/28/2007
  • Published: 04/02/2009
  • Est. Priority Date: 09/28/2007
  • Status: Active Grant
First Claim
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1. A method for depositing material on a substrate having a plurality of surfaces including one or more first surfaces lying substantially parallel to a first plane and one or more second surfaces lying substantially perpendicular to said first plane, the method comprising:

  • directing a gas cluster ion beam (GCIB) formed from a source of precursor to a thin film toward said substrate with a direction of incidence; and

    orienting said substrate relative to said direction of incidence such that said first plane is substantially perpendicular to said direction of incidence to directionally deposit said thin film on said one or more first surfaces oriented substantially perpendicular to said direction of incidence, while substantially avoiding deposition of said thin film on said one or more second surfaces oriented substantially parallel to said direction of incidence.

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