CHAMBER ISOLATION VALVE RF GROUNDING
First Claim
1. A grounded chamber isolation valve for a plasma processing system, comprising:
- a door and a bracing member movably attached to and opposing the door; and
at least one electrically conductive member in electrical communication with the door, the at least one electrically conductive member comprising one or more reaction bumpers disposed on the bracing member that are adapted to contact at least one grounded component of the plasma processing system when the door is in the closed position.
1 Assignment
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Accused Products
Abstract
Embodiments described herein provide a method and apparatus for grounding a chamber isolation valve. In one embodiment, a grounded chamber isolation valve for a plasma processing system is described. The chamber isolation valve includes a door and a bracing member movably attached to and opposing the door, and at least one electrically conductive member in electrical communication with the door, the at least one electrically conductive member comprising one or more reaction bumpers disposed on the bracing member that are adapted to contact at least one grounded component of the plasma processing system when the door is in the closed position.
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Citations
20 Claims
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1. A grounded chamber isolation valve for a plasma processing system, comprising:
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a door and a bracing member movably attached to and opposing the door; and at least one electrically conductive member in electrical communication with the door, the at least one electrically conductive member comprising one or more reaction bumpers disposed on the bracing member that are adapted to contact at least one grounded component of the plasma processing system when the door is in the closed position. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A grounded chamber isolation valve for a plasma processing system, comprising:
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a door and a bracing member movably attached to and opposing the door; and at least one electrically conductive surface comprising a conductive part of the bracing member that is in electrical communication with the door and adapted to contact at least one grounded component of the plasma processing system when the door is in the closed position, wherein the at least one grounded component of the plasma processing system comprises an electrically conductive member. - View Dependent Claims (8, 9, 10, 11, 12, 13)
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14. An apparatus, comprising:
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a closure member movably disposed between a first opening in a first chamber and a second opening in a second chamber, the closure member comprising; a door; and a bracing member, the door and the bracing member being movable relative to each other; and a conductive member disposed on and extending from the closure member, the conductive member electrically coupling the door and a sealing surface proximate the first opening when the bracing member and the door are moved away from each other. - View Dependent Claims (15, 16, 17, 18, 19, 20)
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Specification