METHOD FOR FORMING FILM AND FILM FORMING SYSTEM
First Claim
1. A film forming method for forming a film by directly injecting a liquid precursor through an injecting valve into a chamber inside of which a substrate is held, vaporizing the liquid precursor and then depositing the vaporized liquid precursor on the substrate, comprisinga period setting step to set a migration/evaporation period necessary for atoms or molecules of the liquid precursor on the substrate to migrate and necessary for a reaction by-product material generated on the substrate to evaporate, andan intermittent supplying step that is alternately provided with a supplying period while the liquid precursor is supplied by directly injecting the liquid precursor into the chamber and vaporizing the liquid precursor and a supply halt period while the liquid precursor is not supplied into the chamber, whereinthe supply halt period is set to be equal to or longer than the migration/evaporation period in the intermittent supplying step.
1 Assignment
0 Petitions
Accused Products
Abstract
The present claimed invention is a film forming system 1 that forms a film by vaporizing a liquid precursor and then depositing the vaporized liquid precursor on a substrate 2, and comprises a chamber 3 inside of which the substrate 2 is held, an injection valve 4 that directly injects the liquid precursor into the chamber 3, and a control unit 11 that alternately sets a supplying period while the liquid precursor is directly injected into the chamber 3 to supply the liquid precursor in a vaporized state and a supply halt period while the liquid precursor is not supplied into the chamber 3 and controls the supplying period and the supply halt period by periodically opening and closing the injection valve 4 so as to intermittently supply the liquid precursor into the chamber 3, and is characterized by that the control unit 11 controls the supply halt period to be equal to or longer than a migration/evaporation period necessary for atoms or molecules of the liquid precursor deposited on the substrate 2 to migrate and necessary for a reaction by-product material generated on the substrate 2 to evaporate. An object of this invention is to generate a thin film of high grade having less impure substances.
30 Citations
20 Claims
-
1. A film forming method for forming a film by directly injecting a liquid precursor through an injecting valve into a chamber inside of which a substrate is held, vaporizing the liquid precursor and then depositing the vaporized liquid precursor on the substrate, comprising
a period setting step to set a migration/evaporation period necessary for atoms or molecules of the liquid precursor on the substrate to migrate and necessary for a reaction by-product material generated on the substrate to evaporate, and an intermittent supplying step that is alternately provided with a supplying period while the liquid precursor is supplied by directly injecting the liquid precursor into the chamber and vaporizing the liquid precursor and a supply halt period while the liquid precursor is not supplied into the chamber, wherein the supply halt period is set to be equal to or longer than the migration/evaporation period in the intermittent supplying step.
-
6. A film forming method for forming a film by directly injecting a liquid precursor through an injection valve into a chamber inside of which a substrate is held, vaporizing the liquid precursor and then depositing the vaporized liquid precursor on the substrate, alternately having
a supplying process that supplies the liquid precursor by directly injecting the liquid precursor into the chamber and vaporizing the liquid precursor and a supply halt process that does not supply the liquid precursor into the chamber, wherein in the supply halt process, the film deposited on the substrate is optically measured and the supplying process and/or the supply halt process is controlled based on the measurement result.
-
9. A film forming system that forms a film by vaporizing a liquid precursor and then depositing the vaporized liquid precursor on a substrate, comprising
a chamber inside of which the substrate is held, an injection valve that directly injects the liquid precursor into the chamber, and a control unit that alternately sets a supplying period while the liquid precursor is directly injected into the chamber to supply the liquid precursor in a vaporized state and a supply halt period while the liquid precursor is not supplied into the chamber and controls the supplying period and the supply halt period by periodically opening and closing the injection valve so as to intermittently supply the liquid precursor into the chamber, wherein the control unit controls the supply halt period to be equal to or longer than a migration/evaporation period necessary for atoms or molecules of the liquid precursor deposited on the substrate to migrate and necessary for a reaction by-product material generated on the substrate to evaporate.
-
13. A film forming system that forms a film by vaporizing a liquid precursor and depositing the vaporized liquid precursor on a substrate, comprising
a chamber inside of which the substrate is held, an injection valve that directly injects the liquid precursor into the chamber, a measuring device that optically measures the film deposited on the substrate, and a control unit that alternately sets a supplying process while the liquid precursor is directly injected into the chamber to supply the liquid precursor in a vaporized state and a supply halt process while the liquid precursor is not supplied into the chamber and controls the supplying process and the supply halt process by periodically opening and closing the injection valve so as to intermittently supply the liquid precursor into the chamber and that controls the measuring device to conduct the measurement during the supply halt process and controls the supplying process and/or the supply halt process based on the measurement result.
Specification