×

METHOD FOR FORMING FILM AND FILM FORMING SYSTEM

  • US 20090092741A1
  • Filed: 03/13/2006
  • Published: 04/09/2009
  • Est. Priority Date: 03/18/2005
  • Status: Abandoned Application
First Claim
Patent Images

1. A film forming method for forming a film by directly injecting a liquid precursor through an injecting valve into a chamber inside of which a substrate is held, vaporizing the liquid precursor and then depositing the vaporized liquid precursor on the substrate, comprisinga period setting step to set a migration/evaporation period necessary for atoms or molecules of the liquid precursor on the substrate to migrate and necessary for a reaction by-product material generated on the substrate to evaporate, andan intermittent supplying step that is alternately provided with a supplying period while the liquid precursor is supplied by directly injecting the liquid precursor into the chamber and vaporizing the liquid precursor and a supply halt period while the liquid precursor is not supplied into the chamber, whereinthe supply halt period is set to be equal to or longer than the migration/evaporation period in the intermittent supplying step.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×