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METHOD FOR MANUFACTURING POLISHING PAD

  • US 20090093202A1
  • Filed: 04/19/2007
  • Published: 04/09/2009
  • Est. Priority Date: 04/19/2006
  • Status: Abandoned Application
First Claim
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1. A method for manufacturing a polishing pad, comprising the steps of:

  • preparing a cell-dispersed urethane composition by a mechanical foaming method;

    continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material;

    laminating another face material on the cell-dispersed urethane composition;

    curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer comprising a polyurethane foam is formed;

    cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each comprising the polishing layer and the face material are simultaneously formed; and

    cutting the long polishing layers.

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