METHOD FOR MANUFACTURING POLISHING PAD

• US 20090093202A1
• Filed: 04/19/2007
• Published: 04/09/2009
• Est. Priority Date: 04/19/2006
• Status: Abandoned Application

• Current Assignee: TOYO Tire & Rubber Company Limited (Toyo Tire Corporation)
• Original Assignee: TOYO Tire & Rubber Company Limited (Toyo Tire Corporation)
• Inventors: Watanabe, Tsuguo, Hirose, Junji, Fukuda, Takeshi, Nakamura, Kenji, Doura, Masato
• Application Number:
  US12/297,862
• Publication Number:
  US 20090093202A1
• Time in Patent Office: Days
• US Class Current: 451/533
• CPC Class Codes: B24B 37/205 provided with a window for inspecting the surface of the work being lapped
• CPC Class Codes: B24B 37/22 characterised by a multi-layered structure
• CPC Class Codes: B24B 37/24 characterised by the composition or properties of the pad materials
• CPC Class Codes: B24B 37/26 characterised by the shape of the lapping pad surface, e.g. grooved
• CPC Class Codes: B24D 11/003 without embedded abrasive particles B24D11/005 takes precedence
• CPC Class Codes: B24D 18/00 Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
• CPC Class Codes: B24D 3/32 for porous or cellular structure
• CPC Class Codes: B29C 44/24 Making multilayered articles
• CPC Class Codes: B29C 44/308 Thickness separators and side seals
• CPC Class Codes: B29C 44/32 Incorporating or moulding on preformed parts, e.g. linings, inserts or reinforcements
• CPC Class Codes: B29C 44/322 the preformed parts being elongated inserts, e.g. cables
• CPC Class Codes: B29C 44/326 Joining the preformed parts, e.g. to make flat or profiled sandwich laminates
• CPC Class Codes: B29C 44/5654 Subdividing foamed articles to obtain particular surface properties, e.g. on multiple modules
• CPC Class Codes: C08J 2375/08 from polyethers
• CPC Class Codes: C08J 9/30 by mixing gases into liquid compositions or plastisols, e.g. frothing with air
• CPC Class Codes: Y10T 156/1052 with cutting, punching, tearing or severing
• CPC Class Codes: Y10T 156/1059 Splitting sheet lamina in plane intermediate of faces

Abstract

A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.

Claims

1. A method for manufacturing a polishing pad, comprising the steps of:

preparing a cell-dispersed urethane composition by a mechanical foaming method;

continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material;

laminating another face material on the cell-dispersed urethane composition;

curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer comprising a polyurethane foam is formed;

cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each comprising the polishing layer and the face material are simultaneously formed; and

cutting the long polishing layers.

2. A polishing pad manufactured by the method according to claim 1.

3. A method for manufacturing a laminated polishing pad, comprising the steps of:

preparing a cell-dispersed urethane composition by a mechanical foaming method;

continuously discharging the cell-dispersed urethane composition onto a cushion layer, while feeding the cushion layer;

laminating another cushion layer on the cell-dispersed urethane composition;

curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer comprising a polyurethane foam is formed;

cutting the polishing layer parallel to the face into two pieces so that two long laminated sheets each comprising the polishing layer and the cushion layer are simultaneously formed; and

cutting the long laminated sheets.

4. A laminated polishing pad manufactured by the method according to claim 3.

5. A method for manufacturing a polishing pad, comprising the steps of:

preparing a cell-dispersed urethane composition by a mechanical foaming method;

providing spacers on both ends parts and/or an inner site of a face material, while feeding the face material;

continuously discharging said cell-dispersed urethane composition onto a part of said face material where the spacer is not provided;

laminating another face material on said discharged cell-dispersed urethane composition;

curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a long polishing layer comprising a polyurethane foam is formed; and

cutting the long polishing layer.

6. The method according to claim 5, wherein the spacer comprises a thermoplastic resin or a thermosetting resin.

7. The method according to claim 5, wherein the spacer provided on the inner site has a light transmittance of at least 20% throughout the wavelength range of 400 nm to 700 nm.

8. The method according to claim 5, wherein the spacer comprises a polyurethane foam whose composition is the same as that of said cell-dispersed urethane composition.

9. The method according to claim 5, wherein the spacer provided on the inner site is a laminate comprising at least two peelable resin sheets.

10. A polishing pad manufactured by the method according to claim 5.

36. A method for manufacturing a semiconductor device, comprising the step of polishing a surface of a semiconductor wafer with the polishing pad according to claim 2, 10 or 23, the laminated polishing pad according to claim 4, 17 or 29, the groove-carrying polishing pad according to claim 34, or the groove-carrying laminated polishing pad according to claim 35.

11. A method for manufacturing a laminated polishing pad, comprising the steps of:

preparing a cell-dispersed urethane composition by a mechanical foaming method;

providing spacers on both ends parts and/or an inner site of a cushion layer, while feeding the cushion layer;

continuously discharging said cell-dispersed urethane composition onto a part of said cushion layer where the spacer is not provided;

laminating a face material on said discharged cell-dispersed urethane composition;

curing the cell-dispersed urethane composition to form a polishing layer comprising a polyurethane foam, while controlling its thickness to be uniform, so that a long laminated sheet is formed; and

cutting the long laminated sheet.

12. The method according to claim 11, wherein the spacer comprises a thermoplastic resin or a thermosetting resin.

13. The method according to claim 11, wherein the spacer provided on the inner site is inserted in a through hole of the cushion layer and provided so as to protrude from the cushion layer.

14. The method according to claim 13, wherein the spacer provided on the inner site has a light transmittance of at least 20% over the wavelength range of 400 nm to 700 nm.

15. The method according to claim 11, wherein the spacer comprises a polyurethane foam whose composition is the same as that of said cell-dispersed urethane composition.

16. The method according to claim 11, wherein the spacer provided on the inner site is a laminate comprising at least two peelable resin sheets.

17. A laminated polishing pad manufactured by the method according to claim 11.

18. A method for manufacturing a polishing pad, comprising the steps of:

preparing a cell-dispersed urethane composition by a mechanical foaming method;

continuously or intermittently discharging a light transmitting region-forming material onto a prescribed site of a face material, while feeding the face material;

continuously discharging said cell-dispersed urethane composition onto a part of said face material where the light transmitting region-forming material is not provided;

laminating another face material on said discharged light transmitting region-forming material and cell-dispersed urethane composition;

curing the light transmitting region-forming material and the cell-dispersed urethane composition, while controlling their thickness to be uniform, so that a long polishing layer comprising a light transmitting region and a polishing region integrated therewith is formed; and

cutting the long polishing layer.

19. The method according to claim 18, wherein said light transmitting region-forming material has a viscosity of 1 to 30 Pa·

s when discharged.

20. The method according to claim 18, wherein said cell-dispersed urethane composition has a viscosity of 1 to 20 Pa·

s when discharged.

21. The method according to claim 18, wherein said light transmitting region comprises a thermosetting resin.

22. The method according to claim 21, wherein said thermosetting resin is a polyurethane resin.

23. A polishing pad manufactured by the method according to claim 18.

24. A method for manufacturing a laminated polishing pad, comprising the steps of:

preparing a cell-dispersed urethane composition by a mechanical foaming method;

discharging a light transmitting region-forming material such that the material is deposited in and on through holes, while feeding a cushion layer having continuously or intermittently provided through holes;

continuously discharging said cell-dispersed urethane composition onto a part of said cushion layer where the light transmitting region-forming material is not provided;

laminating a face material on the discharged light transmitting region-forming material and cell-dispersed urethane composition;

curing the light transmitting region-forming material and the cell-dispersed urethane composition, while controlling their thickness to be uniform, so that a long laminated sheet comprising a light transmitting region and a polishing region integrated therewith is formed; and

cutting the long laminated sheet.

25. The method according to claim 24, wherein said light transmitting region-forming material has a viscosity of 1 to 30 Pa·

s when discharged.

26. The method according to claim 24, wherein said cell-dispersed urethane composition has a viscosity of 1 to 20 Pa·

s when discharged.

27. The method according to claim 24, wherein said light transmitting region comprises a thermosetting resin.

28. The method according to claim 27, wherein said thermosetting resin is a polyurethane resin.

29. A laminated polishing pad manufactured by the method according to claim 24.

30. A method for manufacturing a groove-carrying polishing pad, comprising the steps of:

preparing a cell-dispersed urethane composition by a mechanical foaming method;

continuously discharging the cell-dispersed urethane composition onto a conveyor belt having a recessed structure;

laminating a face material on the discharged cell-dispersed urethane composition;

curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a groove-carrying long polishing layer comprising a polyurethane foam is formed;

separating the groove-carrying long polishing layer from the conveyor belt; and

cutting the groove-carrying long polishing layer.

34. A groove-carrying polishing pad manufactured by the method according to claim 30 or 31.

31. A method for manufacturing a groove-carrying polishing pad, comprising the steps of:

preparing a cell-dispersed urethane composition by a mechanical foaming method;

continuously discharging the cell-dispersed urethane composition onto a release sheet having a recessed structure, while feeding the release sheet;

laminating a face material on the discharged cell-dispersed urethane composition;

curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a groove-carrying long polishing layer comprising a polyurethane foam is formed;

separating the release sheet from the groove-carrying long polishing layer; and

cutting the groove-carrying long polishing layer.

32. A method for manufacturing a groove-carrying laminated polishing pad, comprising the steps of:

preparing a cell-dispersed urethane composition by a mechanical foaming method;

continuously discharging the cell-dispersed urethane composition onto a conveyor belt having a recessed structure;

laminating a cushion layer on the discharged cell-dispersed urethane composition;

curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a groove-carrying long polishing layer comprising a polyurethane foam is formed and then a groove-carrying long laminated sheet is formed;

separating the groove-carrying long laminated sheet from the conveyor belt; and

cutting the groove-carrying long laminated sheet.

35. A groove-carrying laminated polishing pad manufactured by the method according to claim 32 or 33.

33. A method for manufacturing a groove-carrying laminated polishing pad, comprising the steps of:

preparing a cell-dispersed urethane composition by a mechanical foaming method;

continuously discharging the cell-dispersed urethane composition onto a release sheet having a recessed structure, while feeding the release sheet;

laminating a cushion layer on the discharged cell-dispersed urethane composition;

curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a groove-carrying long polishing layer comprising a polyurethane foam is formed and then a groove-carrying long laminated sheet is formed;

separating the release sheet from the groove-carrying long laminated sheet; and

cutting the groove-carrying long laminated sheet.