MULTI-GAS CONCENTRIC INJECTION SHOWERHEAD
First Claim
Patent Images
1. A showerhead apparatus comprising:
- a first plenum for a first precursor gas;
a second plenum for a second precursor gas; and
a plurality of inner and outer injection holes wherein the inner injection holes are disposed within the boundaries of the outer injection holes, the inner injection holes in fluid communication with the first plenum and the outer injection holes in fluid communication with the second plenum.
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Abstract
A method and apparatus that may be utilized for chemical vapor deposition and/or hydride vapor phase epitaxial (HVPE) deposition are provided. In one embodiment, a metal organic chemical vapor deposition (MOCVD) process is used to deposit a Group III-nitride film on a plurality of substrates. A Group III precursor, such as trimethyl gallium, trimethyl aluminum or trimethyl indium and a nitrogen-containing precursor, such as ammonia, are separately delivered to a plurality of concentric gas injection ports. The precursor gases are injected into mixing zones where the gases are mixed before entering a processing volume containing the substrates.
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Citations
41 Claims
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1. A showerhead apparatus comprising:
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a first plenum for a first precursor gas; a second plenum for a second precursor gas; and a plurality of inner and outer injection holes wherein the inner injection holes are disposed within the boundaries of the outer injection holes, the inner injection holes in fluid communication with the first plenum and the outer injection holes in fluid communication with the second plenum. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A showerhead apparatus comprising:
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a plurality of precursor mixing channels defined on a side of the showerhead that faces a substrate processing volume; a plurality of first injection holes through which a first precursor gas is injected into the precursor mixing channels; and a plurality of second injection holes through which a second precursor gas is injected into the precursor mixing channels, wherein each of the first injection holes has a second injection hole that is disposed within the boundary of the first gas injection hole. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30)
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31. A showerhead apparatus comprising:
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a first plenum for a first precursor gas; a plurality of first gas conduits through which the first precursor gas is supplied from the first plenum to a precursor mixing zone; a second plenum for a second precursor gas; and a plurality of second gas conduits through which the second precursor gas is supplied from the second plenum to the precursor mixing zone, wherein each of the first gas conduits has a second gas conduit that is disposed within the boundary of the first gas conduit. - View Dependent Claims (32, 33, 34, 35, 36, 37, 38, 39, 40, 41)
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Specification