MULTI-GAS SPIRAL CHANNEL SHOWERHEAD
First Claim
Patent Images
1. A showerhead apparatus comprising:
- a first gas channel for a first precursor gas; and
a second gas channel for a second precursor gas, arranged to be coplanar with the first gas channel.
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Abstract
A method and apparatus that may be utilized for chemical vapor deposition and/or hydride vapor phase epitaxial (HVPE) deposition are provided. In one embodiment, a metal organic chemical vapor deposition (MOCVD) process is used to deposit a Group III-nitride film on a plurality of substrates. A Group III precursor, such as trimethyl gallium, trimethyl aluminum or trimethyl indium and a nitrogen-containing precursor, such as ammonia, are delivered to a plurality of spiral channels which isolate the precursor gases. The precursor gases are injected into a mixing channel where the gases are mixed before entering a processing volume containing the substrates.
189 Citations
32 Claims
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1. A showerhead apparatus comprising:
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a first gas channel for a first precursor gas; and a second gas channel for a second precursor gas, arranged to be coplanar with the first gas channel. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A showerhead apparatus comprising:
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a first gas channel for a first precursor gas having injection holes through which the first precursor gas is injected into a precursor mixing zone; and a second gas channel for a second precursor gas having injection holes through which the second precursor gas is injected into the precursor mixing zone. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20, 21)
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22. A showerhead apparatus comprising:
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a first channel for a first precursor gas; a second channel for a second precursor gas; and a third channel for a heat exchanging medium. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29, 30, 31, 32)
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Specification