ELECTROSTATIC CHUCK ASSEMBLY
First Claim
1. An electrostatic chuck base, comprising:
- an electrostatic chuck base body having one or more cooling channels formed within the body and a plurality of grooves formed in at least one of the one or more cooling channels.
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Accused Products
Abstract
The present invention generally comprises an electrostatic chuck base, an electrostatic chuck assembly, and a puck for the electrostatic chuck assembly. Precisely etching a substrate within a plasma chamber may be a challenge because the plasma within the chamber may cause the temperature across the substrate to be non-uniform. A temperature gradient may exist across the substrate such that the edge of the substrate is at a different temperature compared to the center of the substrate. When the temperature of the substrate is not uniform, features may not be uniformly etched into the various layers of the structure disposed above the substrate. A dual zone electrostatic chuck assembly may compensate for temperature gradients across a substrate surface.
57 Citations
21 Claims
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1. An electrostatic chuck base, comprising:
an electrostatic chuck base body having one or more cooling channels formed within the body and a plurality of grooves formed in at least one of the one or more cooling channels. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A puck for an electrostatic chuck assembly, comprising:
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a puck body; and a plurality of mesas arranged across the puck body in at least two different patterns. - View Dependent Claims (11, 12)
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13. An electrostatic chuck assembly, comprising:
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a puck, the puck comprising; a puck body; and a plurality of mesas arranged across the puck body in at least two different patterns; and an electrostatic chuck base body having one or more cooling channels formed within the body and a plurality of grooves formed in at least one of the one or more cooling channels. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21)
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Specification