DRY-ETCHING METHOD

• US 20090098736A1
• Filed: 12/16/2008
• Published: 04/16/2009
• Est. Priority Date: 06/15/2001
• Status: Active Grant

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Yamada, Norikazu, Iijima, Etsuo
• Granted Patent: US 8,288,286 B2
• Time in Patent Office: Days
• US Class Current: 438/720
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge
• CPC Class Codes: H01L 21/32137 of silicon-containing layers

Abstract

A main etching step is effected in a state shown in FIG. 1A under a first pressure using a gas containing at least HBr, e.g., a mixture gas of HBr and Cl₂ as an etching gas. The main etching is ended before a silicon oxide film 102, as shown in FIG. 1B, is exposed. An over-etching process is effected under a second pressure higher than the first pressure using a gas containing at least HBr, e.g., an HBr single gas so as to completely expose the silicon oxide film 102 as shown in FIG. 1C. In such a way, the selectivity of a silicon-containing conductive layer with respect to the silicon oxide film is improved compared to conventional methods. Without etching the silicon oxide film layer, which is an underlying layer, and without marring the shape of the silicon-containing conductive film layer formed by etching, only the desired silicon-containing conductive film layer is removed by etching reliably.

Claims

1-11. -11. (canceled)

12. :

A plasma processing method for use in a plasma processing apparatus, which includes a vacuum chamber for accommodating a substrate to be processed therein to perform a plasma processing thereon;

an electrode provided in the vacuum chamber;

a first high frequency power supply for supplying a first high frequency power to the electrode;

a DC power supply for supplying a DC voltage to the electrode, the method comprising;

starting supplying the DC voltage from the DC power supply to the electrode; and

then, starting supplying the first high frequency power from the first high frequency power supply to the electrode.

13. :

The plasma processing method of claim 12, wherein the electrode is an upper electrode provided in an upper portion of the vacuum chamber.

14. :

The plasma processing method of claim 13, wherein the plasma processing apparatus further includes a lower electrode on which the substrate is mounted; and

a second high frequency power supply for supplying a second high frequency power to the lower electrode, and

the method further comprising;

starting supplying the second high frequency power from the second high frequency power supply to the lower electrode after the starting supplying the DC voltage from the DC power supply to the upper electrode.

15. :

The plasma processing method of claim 14, wherein the lower electrode includes an electrostatic chuck to which the substrate is electrostatically adhered; and

the method further comprising;

supplying the DC voltage to the electrostatic chuck after the starting supplying the first high frequency power from the first high frequency power supply to the electrode.

16. :

A plasma processing method for use in a plasma processing apparatus, which includes a vacuum chamber for accommodating a substrate to be processed therein to perform a plasma processing thereon;

a lower electrode, provided in the vacuum chamber, on which the substrate is mounted;

an upper electrode provided in the vacuum chamber to face the lower electrode;

a first high frequency power supply for supplying a first high frequency power to the upper electrode;

a second high frequency power supply for supplying a second high frequency power to the lower electrode; and

a DC power supply supplying a DC voltage to the upper electrode, the method comprising;

starting supplying the DC voltage from the DC power supply to the upper electrode; and

then, starting supplying the first high frequency power from the first high frequency power supply to the upper electrode and supplying the second high frequency power from the second high frequency power supply to the lower electrode.

17. :

The plasma processing method of claim 16, wherein the starting supplying the second high frequency power is performed after the starting supplying the first high frequency power.

18. :

The plasma processing method of claim 16, wherein the lower electrode of the plasma processing apparatus includes an electrostatic chuck to which the substrate to be processed is electrostatically adhered; and

the method further comprising;

supplying the DC voltage to the electrostatic chuck after the starting supplying the first high frequency power and supplying the second high frequency power are performed.

19. :

A plasma processing apparatus comprising;

a vacuum chamber for accommodating a substrate to be processed therein to perform a plasma processing thereon;

a lower electrode, provided in the vacuum chamber, on which the substrate is mounted;

a upper electrode provided in the vacuum chamber to face the lower electrode;

a first high frequency power supply for supplying a first high frequency power to the upper electrode;

a second high frequency power supply for supplying a second high frequency power to the lower electrode; and

a DC power supply for supplying a DC voltage to the upper electrode,

wherein supplying the first high frequency power from the first high frequency power supply to the upper electrode and the second high frequency power from the second high frequency power supply to the lower electrode are started after supplying the DC voltage from the DC power supply to the upper electrode is started.

20. :

The plasma processing apparatus of claim 19, wherein the supplying the second high frequency power is started after the supplying the first high frequency power is started.

21. :

The plasma processing apparatus of claim 19, wherein the lower electrode includes an electrostatic chuck to which the substrate is electrostatically adhered, and

wherein the DC voltage is supplied to the electrostatic chuck after the supplying the first high frequency power and the second high frequency power are started.