PATTERN MATCHING METHOD IN MANUFACTURING SEMICONDUCTOR MEMORY DEVICES
First Claim
1. A pattern matching method for use in manufacturing a semiconductor memory device, the method comprising:
- extracting a scanning electron microscope (SEM) image and a graphic data system (GDS) image to perform pattern matching;
performing a two-dimensional Fourier transform (FFT) for the extracted GDS image and analyzing a low spatial frequency; and
limiting an X/Y range for pattern matching when the analyzed low spatial frequency is compared to a predetermined threshold value and is smaller than the threshold value, and then performing the pattern matching between the extracted SEM image and the GDS image.
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Abstract
A pattern matching method for use in manufacturing a semiconductor memory device increases a pattern matching rate between a GDS image and an SEM image. The pattern matching method includes extracting a scanning electron microscope (SEM) image and a graphic data system (GDS) image to perform a pattern matching; performing a two-dimensional furrier transform (FFT) for the extracted GDS image and analyzing a low spatial frequency; deciding whether or not a pattern is a repeated pattern or non-repeated pattern by using the analyzed low spatial frequency; and limiting an X/Y range for a pattern matching when the decision result is for the repeated pattern, and then performing the pattern matching between the SEM image and the GDS image.
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Citations
6 Claims
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1. A pattern matching method for use in manufacturing a semiconductor memory device, the method comprising:
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extracting a scanning electron microscope (SEM) image and a graphic data system (GDS) image to perform pattern matching; performing a two-dimensional Fourier transform (FFT) for the extracted GDS image and analyzing a low spatial frequency; and limiting an X/Y range for pattern matching when the analyzed low spatial frequency is compared to a predetermined threshold value and is smaller than the threshold value, and then performing the pattern matching between the extracted SEM image and the GDS image. - View Dependent Claims (2)
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3. A pattern matching method for use in manufacturing a semiconductor memory device, the method comprising:
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extracting an SEM image and a GDS image to perform pattern matching; performing a two-dimensional FFT for the extracted GDS image and analyzing a low spatial frequency; determining whether pattern is a repeated pattern or non-repeated pattern by using the analyzed low spatial frequency; and limiting an X/Y range for pattern matching when the pattern is a repeated pattern and then performing pattern matching between the SEM image and the GDS image. - View Dependent Claims (4, 5, 6)
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Specification