Exposure method, exposure apparatus, and method for producing device

• US 20090104568A1
• Filed: 12/17/2008
• Published: 04/23/2009
• Est. Priority Date: 05/28/2003
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Hirukawa, Shigeru
• Granted Patent: US 8,711,324 B2
• Time in Patent Office: Days
• US Class Current: 430/322
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70433 Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70858 Environment aspects, e.g. pressure of beam-path gas, temperature pollution aspects G03F7/70916
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
• CPC Class Codes: G03F 7/70891 Temperature

Abstract

An exposure method exposes a substrate by projecting an image of a pattern onto the substrate through a liquid by using a projection optical system while moving the substrate in a predetermined direction. A temperature distribution of the liquid in a direction intersecting the predetermined direction is measured. A projection state of the image of the pattern is adjusted on the basis of information about the measured temperature distribution. The substrate is exposed to the image of the pattern in the projection state.

Claims

1. An exposure method for exposing a substrate by projecting an image of a pattern onto the substrate through a liquid by using a projection optical system while moving the substrate in a predetermined direction, the exposure method comprising:

measuring a temperature distribution of the liquid in a direction intersecting the predetermined direction;

adjusting a projection state of the image of the pattern on the basis of information about the measured temperature distribution; and

exposing the substrate in the projection state of the image of the pattern.

2. The exposure method according to claim 1, wherein the temperature distribution of the liquid is measured by using a temperature sensor arranged on a substrate stage which is movable while holding the substrate.

3. The exposure method according to claim 1, wherein the adjustment of the projection state of the image of the pattern includes adjustment of a positional relationship between an exposure surface on the substrate and an image plane formed via the projection optical system and the liquid.

4. The exposure method according to claim 1, wherein the adjustment of the projection state of the image of the pattern includes adjustment of a temperature of the liquid supplied to form a liquid immersion area.

5. The exposure method according to claim 4, wherein the liquid is supplied at a plurality of supply positions, and the temperature of the liquid is made to differ depending on the supply positions.

6. A method for producing a device, comprising using the exposure method as defined in claim 1.