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Exposure method, exposure apparatus, and method for producing device

  • US 20090104568A1
  • Filed: 12/17/2008
  • Published: 04/23/2009
  • Est. Priority Date: 05/28/2003
  • Status: Active Grant
First Claim
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1. An exposure method for exposing a substrate by projecting an image of a pattern onto the substrate through a liquid by using a projection optical system while moving the substrate in a predetermined direction, the exposure method comprising:

  • measuring a temperature distribution of the liquid in a direction intersecting the predetermined direction;

    adjusting a projection state of the image of the pattern on the basis of information about the measured temperature distribution; and

    exposing the substrate in the projection state of the image of the pattern.

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