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METHODS OF DEPOSITING A RUTHENIUM FILM

  • US 20090104777A1
  • Filed: 10/14/2008
  • Published: 04/23/2009
  • Est. Priority Date: 10/17/2007
  • Status: Active Grant
First Claim
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1. A method of depositing a ruthenium film, the method comprising:

  • loading a substrate into a reactor; and

    conducting a plurality of deposition cycles, at least one of the cycles comprising steps of;

    supplying a ruthenium precursor to the reactor;

    supplying oxygen (O2) gas to the reactor; and

    supplying ammonia (NH3) gas to the reactor after supplying the ruthenium precursor and the oxygen gas without supplying the ruthenium precursor and the oxygen gas.

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