System and method for locating components of a structure

• US 20090106988A1
• Filed: 10/26/2007
• Published: 04/30/2009
• Est. Priority Date: 10/26/2007
• Status: Active Grant

• Current Assignee: The Boeing Co.
• Original Assignee: The Boeing Co.
• Inventors: Cobb, James M.
• Granted Patent: US 7,614,154 B2
• Time in Patent Office: Days
• US Class Current: 33/1.BB
• CPC Class Codes: B64F 5/10 Manufacturing or assembling aircraft, e.g. jigs therefor

Abstract

In non-limiting, illustrative embodiments, methods, systems, and manufacturing facilities are provided for locating components of a structure. Locations of features of components of a structure are simultaneously determined. Relative positions of the components are determined in a coordinate system of the structure.

Claims

1. A method for locating components of a structure, the method comprising:

simultaneously determining locations of a plurality of features of a plurality of components of a structure; and

determining relative positions of the plurality of components in a coordinate system of the structure.

2. The method of claim 1, further comprising determining locations of a plurality of transmitters in a constellation of transmitters.

3. The method of claim 2, wherein determining locations of a plurality of transmitters includes determining azimuth and elevation of the plurality of transmitters relative to locations of a plurality of reference targets that are arranged in an assembly area in a plurality of predetermined positions that are known in a coordinate system of the assembly area.

4. The method of claim 1, further comprising:

preparing the plurality of components for measurement; and

placing the plurality of components in an assembly area.

5. The method of claim 4, wherein preparing the plurality of components for measurement includes disposing a plurality of component targets about the plurality of components in a plurality of predetermined locations that are known in the coordinate system of the structure.

6. The method of claim 3, wherein simultaneously determining locations of a plurality of features of a plurality of components includes simultaneously determining azimuth and elevation of a plurality of component targets arranged in a plurality of predetermined positions on the plurality of components relative to the locations of the plurality of transmitters.

7. The method of claim 6, wherein determining relative positions of the components includes converting azimuth and elevation into coordinates in the coordinate system of the structure.

8. A method for locating components of a structure, the method comprising:

determining locations of a plurality of transmitters in a constellation of transmitters relative to locations of a plurality of reference targets that are arranged in an assembly area in a plurality of predetermined positions that are known in a coordinate system of the assembly area;

simultaneously determining locations of a plurality of features of a plurality of components of the structure relative to the locations of the plurality of transmitters; and

determining relative positions of the plurality of components in a coordinate system of the structure.

9. The method of claim 8, wherein determining locations of a plurality of transmitters includes determining azimuth and elevation of the plurality of transmitters relative to locations of the plurality of reference targets.

10. The method of claim 9, wherein simultaneously determining locations of a plurality of features of a plurality of components includes simultaneously determining azimuth and elevation of a plurality of component targets arranged on the plurality of components in a plurality of predetermined positions that are known in the coordinate system of the structure relative to the locations of the plurality of transmitters.

11. The method of claim 10, wherein determining relative positions of the components includes converting azimuth and elevation into coordinates in the coordinate system of the structure.

12. A system for locating components of a structure, the system comprising:

a measurement system configured to simultaneously determine locations of a plurality of features of a plurality of components of a structure that is disposed in tooling, the measurement system being located separate from the tooling; and

a data processing system configured to determine relative positions of the plurality of components in a coordinate system of the structure.

13. The system of claim 12, wherein the measurement system includes a plurality of transmitters arranged in a constellation.

14. The system of claim 13, wherein the measurement system further includes a plurality of component targets disposed about the plurality of components in a plurality of predetermined locations that are known in the coordinate system of the structure.

15. The system of claim 14, wherein the measurement system further includes a plurality of reference targets that are arranged in an assembly area in a plurality of predetermined positions that are known in the coordinate system of the assembly area.

16. The system of claim 15, wherein:

the measurement system includes an infrared global positioning system;

the plurality of transmitters includes a plurality of infrared transmitters; and

the plurality of component targets and the plurality of reference targets include a plurality of infrared detectors.

17. The system of claim 15, wherein:

the measurement system includes a photogrammetry system including a plurality of cameras;

the plurality of transmitters includes a plurality of flash-emitting devices, each of the plurality of flash-emitting devices being co-located with an associated camera of the plurality of cameras;

the plurality of component targets and the plurality of reference targets include a plurality of passive reflectors.

18. The system of claim 15, wherein the data processing system includes a data processing unit including:

a first data processing component configured to determine azimuth and elevation of the plurality of transmitters relative to the locations of the plurality of reference targets; and

a second data processing component configured to determine azimuth and elevation of the plurality of component targets relative to the locations of the plurality of transmitters.

19. The system of claim 18, wherein data processing unit further includes a third data processing component configured to convert azimuth and elevation into coordinates in the coordinate system of the structure.

20. A manufacturing facility comprising:

an assembly area arranged to receive for assembly therein a plurality of components of a structure, the assembly area having a coordinate system; and

a system for locating the plurality of components, the plurality of components being disposed in tooling, the system including;

a measurement system configured to simultaneously determine locations of a plurality of features of the plurality of components, the measurement system being located separate from the tooling; and

a data processing system configured to determine relative positions of the plurality of components in a coordinate system of the structure.

21. The manufacturing facility of claim 20, wherein the measurement system includes a plurality of transmitters arranged in a constellation.

22. The manufacturing facility of claim 21, wherein the measurement system further includes a plurality of component targets disposed about the plurality of components in a plurality of predetermined locations that are known in the coordinate system of the structure.

23. The manufacturing facility of claim 22, wherein the measurement system further includes a plurality of reference targets that are arranged in an assembly area in a plurality of predetermined positions that are known in the coordinate system of the assembly area.

24. The manufacturing facility of claim 23, wherein:

the measurement system includes an infrared global positioning system;

the plurality of transmitters includes a plurality of infrared transmitters; and

the plurality of component targets and the plurality of reference targets include a plurality of infrared detectors.

25. The manufacturing facility of claim 23, wherein:

the measurement system includes a photogrammetry system including a plurality of cameras;

the plurality of transmitters includes a plurality of flash-emitting devices, each of the plurality of flash-emitting devices being co-located with an associated camera of the plurality of cameras;

the plurality of component targets and the plurality of reference targets include a plurality of passive reflectors.