×

EPITAXIAL REACTOR WITH SUSCEPTOR CONTROLLED POSITIONING

  • US 20090107404A1
  • Filed: 07/30/2004
  • Published: 04/30/2009
  • Est. Priority Date: 07/30/2004
  • Status: Abandoned Application
First Claim
Patent Images

1. A reactor for chemical vapour deposition comprising:

  • a reaction chamber, a susceptor which can be moved in the chamber, a transmitting means to transmit electromagnetic radiation towards the susceptor, and a detecting means to detect the radiation, at least one projecting reference element seated on the susceptor, capable of reflecting the radiation towards said detecting means for detecting it.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×