METHOD FOR PRODUCING LIGHT-TRANSMITTING ELECTROMAGNETIC WAVE-SHIELDING FILM, LIGHT-TRANSMITTING ELECTROMAGNETIC WAVE-SHIELDING FILM AND PLASMA DISPLAY PANEL USING THE SHIELDING FILM

• US 20090110912A1
• Filed: 12/22/2008
• Published: 04/30/2009
• Est. Priority Date: 12/27/2002
• Status: Active Grant

• Current Assignee: Fujifilm Corporation (Fujifilm Holdings Corporation)
• Original Assignee: Fujifilm Corporation (Fujifilm Holdings Corporation)
• Inventors: Morimoto, Kiyoshi, SASAKI, Hirotomo, Takada, Shunji, Nishizakura, Ryou
• Granted Patent: US 9,034,419 B2
• Time in Patent Office: Days
• US Class Current: 428/332
• CPC Class Codes: C03C 17/10 by deposition from the liquid phase
• CPC Class Codes: C03C 17/36 at least one coating being a metal
• CPC Class Codes: C03C 17/3676 specially adapted for use as electromagnetic shield
• CPC Class Codes: C03C 2217/256 Ag
• CPC Class Codes: C03C 2217/445 Organic continuous phases
• CPC Class Codes: C03C 2217/475 Inorganic materials
• CPC Class Codes: C03C 2217/93 Coatings containing a reinforcement comprising fibers or grids
• CPC Class Codes: C03C 2218/11 from solutions or suspensions
• CPC Class Codes: G02F 1/133334 Electromagnetic shields
• CPC Class Codes: G03C 1/08 Sensitivity-increasing substances
• CPC Class Codes: G03C 5/58 Processes for obtaining metallic images by vapour deposition or physical development images obtained by photomechanical means, e.g. by etching G03F
• CPC Class Codes: H01J 11/44 Optical arrangements or shielding arrangements, e.g. filters, black matrices, light reflecting means or electromagnetic shielding means
• CPC Class Codes: H01J 2211/446 Electromagnetic shielding means; Antistatic means
• CPC Class Codes: H01J 2229/8636 Electromagnetic shielding
• CPC Class Codes: H01J 2329/869 Electromagnetic shielding
• CPC Class Codes: H01J 29/868 Screens covering the input or output face of the vessel, e.g. transparent anti-static coatings, X-ray absorbing layers
• CPC Class Codes: H01J 9/205 Applying optical coatings or shielding coatings to the vessel of flat panel displays, e.g. applying filter layers, electromagnetic interference shielding layers, anti-reflection coatings or anti-glare coatings
• CPC Class Codes: H05K 3/106 by photographic methods
• CPC Class Codes: H05K 9/0096 for television displays, e.g. plasma display panel
• CPC Class Codes: Y10T 428/24273 including aperture
• CPC Class Codes: Y10T 428/24802 : Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
• CPC Class Codes: Y10T 428/26 : Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
• CPC Class Codes: Y10T 442/10 : Scrim [e.g., open net or mesh, gauze, loose or open weave or knit, etc.]
• CPC Class Codes: Y10T 442/109 : Metal or metal-coated fiber-containing scrim
• CPC Class Codes: Y10T 442/112 : Particulate free metal or alloy constituent
• CPC Class Codes: Y10T 442/164 : Including a preformed film, foil, or sheet

Abstract

A silver salt-containing layer containing a silver salt and provided on a support is exposed and developed to form a metal silver portion and a light-transmitting portion, and then the metal silver portion is further subjected to physical development and/or plating to form a conductive metal portion consisting of the metal silver portion carrying conductive metal particles. A method for producing a light-transmitting electromagnetic wave-shielding film which enables production of an electromagnetic wave-shielding material simultaneously having high EMI-shielding property and high transparency in a fine line pattern and also enables mass production of such films at a low cost, and a light-transmitting electromagnetic wave-shielding film obtained by the production method and free from the problem of moire are provided.

Claims

1. A method for producing a conductive material having a conductive metal portion and a light-transmitting portion,

which comprises exposing and developing a silver salt-containing layer containing a silver salt and provided on a support to form a metal silver portion and the light-transmitting portion,

wherein the silver salt-containing layer contains Ag and a binder and has an Ag/binder volume ratio of 1/1 or higher.

2. The method for producing a conductive material according to claim 1, wherein the silver salt in the silver salt-containing layer is a silver halide.

3. The method for producing a conductive material according to claim 2, wherein the silver halide consists mainly of silver bromide.

4. The method for producing a conductive material according to claim 2, wherein the silver halide contains a rhodium compound and/or an iridium compound.

5. The method for producing a conductive material according to claim 2, wherein the silver halide contains Pd(II) ions and/or Pd metal.

6. The method for producing a conductive material according to claim 1, wherein the silver salt-containing layer has an Ag/binder volume ratio of 1/1 to 2.

7. The method for producing a conductive material according to claim 1, wherein the silver salt in the silver salt-containing layer has a diameter as sphere of 0.1 to 100 nm.

8. The method for producing a conductive material according to claim 1, wherein the developer used for the development of the silver salt-containing layer is a lith developer.

9. The method for producing a conductive material according to claim 1, wherein an exposed portion after the development contains the metal silver at a content of 50% by weight or more based on the weight of silver contained in the exposed portion before the exposure.

10. The method for producing a conductive material according to claim 1, wherein the plating is performed by electroless plating.

11. The method for producing conductive material according to claim 1, wherein the surface of the conductive metal portion is further subjected to a blackening treatment.

12. The method for producing a conductive material according to claim 1, wherein the light-transmitting portion does not substantially contain physical development nuclei.

13. The method for producing a conductive material according to claim 1, wherein the conductive material has a surface resistance of 2.5 Ω

/sq or lower after the physical development and/or plating, and/or the light-transmitting portion has a transmittance of 95% or higher.

14. A conductive film having a conductive metal portion and a light-transmitting portion, which is obtainable by the production method according to claim 1.

15. The conductive material according to claim 14, wherein weight of silver contained in the conductive metal portion accounts for 50% by weight or more of the total weight of metal components contained in the conductive metal portion.

16. The conductive material according to claim 14, wherein the total weight of silver, copper and palladium contained in the conductive metal portion accounts for 80% by weight or more of the total weight of the all metal components.

17. The conductive material according to claim 14, wherein a layer comprising the conductive metal particles carried by the conductive metal portion has a thickness of 0.1 μ

m or larger and less than 5 μ

m and a surface resistance value of 3 Ω

/sq or smaller.

18. The conductive material according to claim 14, wherein the conductive metal portion has a line width of 0.1 μ

m or larger and smaller than 18 μ

m.

19. A plasma display panel having the conductive material according to claim 14.

21. The method for producing a conductive material according to claim 1, wherein the support is a plastic film, a plastic plate or a glass plate.

22. The method for producing a conductive material according to claim 1, additionally comprising removing silver-salt from unexposed regions of the silver-salt containing layer.

23. The method for producing a conductive material according to claim 2, wherein the silver halide functions as an optical sensor.

24. The method for producing a conductive material according to claim 1, wherein the binder includes water-soluble polymers.

25. The method for producing a conductive material according to claim 1, wherein the binder includes gelatin.

26. The method for producing a conductive material according to claim 1, additionally comprising fixing the developed and exposed silver salt-containing layer.

27. The method for producing a conductive film according to claim 1, wherein the conductive material has an aperture ratio of 85% or higher.

20. (canceled)

28. A material which is used for a conductive material, which comprises

a support, and

a silver-salt containing layer containing a silver salt and provided on the support wherein the silver salt-containing layer contains Ag and a binder and has an Ag/binder volume ratio of 1/1 or higher.