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METHOD FOR PATTERNING MO LAYER IN A PHOTOVOLTAIC DEVICE COMPRISING CIGS MATERIAL USING AN ETCH PROCESS

  • US 20090111209A1
  • Filed: 12/30/2008
  • Published: 04/30/2009
  • Est. Priority Date: 11/22/2006
  • Status: Abandoned Application
First Claim
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1. A method of processing a thin-film structure comprising:

  • etching completely through a portion of a thin film layer in the thin-film structure, wherein the thin film layer comprises molybdenum, thereby completely exposing a corresponding underlying portion of the thin-film structure that does not comprise molybdenum.

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