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Layout designing method for semiconductor device and layout design supporting apparatus for the same

  • US 20090113370A1
  • Filed: 10/29/2008
  • Published: 04/30/2009
  • Est. Priority Date: 10/30/2007
  • Status: Abandoned Application
First Claim
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1. A layout designing method of a semiconductor device, comprising:

  • arranging a first standard cell with a first well and a second standard cell with a second well, wherein said first well and said second well are applied with different voltages, respectively;

    arranging an empty cell in an area that a distance from said first well falls within a first distance; and

    moving said second standard cell such that said empty cell does not overlap with said empty cell, when said empty cell overlaps with said second well.

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