Method of Substrate Processing, Substrate Processing System, and Storage Medium
First Claim
1. A substrate processing system comprising:
- a processing nozzle capable of supplying a processing liquid to a substrate to be processed;
an arm supporting the processing nozzle, the arm being movable between a processing position and a waiting position, the processing nozzle being above the substrate when the arm is in the processing position and being outside the substrate when the arm is in the waiting position; and
a nozzle capable of blowing a gas to the processing nozzle, the nozzle being so situated that the nozzle is in the vicinity of the processing nozzle when the arm is in the waiting position.
1 Assignment
0 Petitions
Accused Products
Abstract
The present invention provides a substrate processing system in which a processing liquid is supplied to a substrate W from a processing nozzle 50a situated above the substrate W so as to process the substrate W, and which makes it possible to prevent unintended dripping of the processing liquid from the processing nozzle. A substrate processing system 20 comprises a processing nozzle 50a capable of supplying a processing liquid to a substrate to be processed, an arm 54 supporting the processing nozzle, and droplet removing nozzles 60, 62 capable of blowing a gas to the processing nozzle. The arm is movable between a processing position and a waiting position, the processing nozzle being above a substrate when the arm is in the waiting position and being outside a substrate when the arm is in the processing position. The droplet removing nozzles are so situated that they are in the vicinity of the processing nozzle when the arm is in the waiting position.
-
Citations
17 Claims
-
1. A substrate processing system comprising:
-
a processing nozzle capable of supplying a processing liquid to a substrate to be processed; an arm supporting the processing nozzle, the arm being movable between a processing position and a waiting position, the processing nozzle being above the substrate when the arm is in the processing position and being outside the substrate when the arm is in the waiting position; and a nozzle capable of blowing a gas to the processing nozzle, the nozzle being so situated that the nozzle is in the vicinity of the processing nozzle when the arm is in the waiting position. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
-
-
11. A method of substrate processing comprising the steps of:
-
positioning a processing nozzle above a substrate to be processed and supplying a processing liquid to the substrate from the processing nozzle; stopping the supply of the processing liquid from the processing nozzle; moving the processing nozzle to the outside of the substrate; and blowing a gas to the processing nozzle situated on the outside of the substrate so as to remove droplets sticking to the processing nozzle. - View Dependent Claims (12, 13, 14, 15, 16)
-
-
17. A storage medium storing a program to be carried out by a control device for controlling a substrate processing system so as to execute a method of substrate processing comprising the steps of:
-
positioning a processing nozzle above a substrate to be processed and supplying a processing liquid to the substrate from the processing nozzle; stopping the supply of the processing liquid from the processing nozzle; moving the processing nozzle to the outside of the substrate; and blowing a gas to the processing nozzle situated on the outside of the substrate so as to remove droplets sticking to the processing nozzle.
-
Specification