Method for Manufacturing a Trench Power Transistor
First Claim
1. A method for manufacturing a trench power transistor comprising:
- providing a substrate;
forming an epitaxy layer on the substrate;
performing a dry etching process on the epitaxy layer for generating a first trench;
forming a gate oxide layer in the first trench and depositing poly-Si on the gate oxide layer in the first trench;
performing a boron implant process on regions outside the first trench and inside the epitaxy layer;
performing an arsenic implant process on regions beside the first trench and inside the epitaxy layer;
depositing a first dielectric material on the surface of the epitaxy layer;
performing a dry etching process on the epitaxy layer for generating a second trench;
depositing a conductive material in the second trench for forming a p-well junction on sidewalls of the second trench; and
performing a wet immersion process for forming a contact hole, and depositing a frontside metal and a backside metal.
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Accused Products
Abstract
A method for manufacturing a trench power transistor includes providing a substrate, forming an epitaxy layer on the substrate, performing a dry etching process on the epitaxy layer for generating a first trench, forming a gate oxide layer in the first trench and depositing poly-Si on the gate oxide layer in the first trench, performing a boron implant process on regions outside the first trench and inside the epitaxy layer, performing an arsenic implant process on regions beside the first trench and inside the epitaxy layer, depositing a first dielectric material on the surface of the epitaxy layer, performing a dry etching process on the epitaxy layer for generating a second trench, depositing a conductive material in the second trench for forming a p-well junction on sidewalls of the second trench, and performing a wet immersion process for forming a contact hole, and depositing frontside and backside metal.
26 Citations
8 Claims
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1. A method for manufacturing a trench power transistor comprising:
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providing a substrate; forming an epitaxy layer on the substrate; performing a dry etching process on the epitaxy layer for generating a first trench; forming a gate oxide layer in the first trench and depositing poly-Si on the gate oxide layer in the first trench; performing a boron implant process on regions outside the first trench and inside the epitaxy layer; performing an arsenic implant process on regions beside the first trench and inside the epitaxy layer; depositing a first dielectric material on the surface of the epitaxy layer; performing a dry etching process on the epitaxy layer for generating a second trench; depositing a conductive material in the second trench for forming a p-well junction on sidewalls of the second trench; and performing a wet immersion process for forming a contact hole, and depositing a frontside metal and a backside metal. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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Specification