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PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, DIELECTRIC WINDOW USED THEREIN, AND MANUFACTURING METHOD OF SUCH A DIELECTRIC WINDOW

  • US 20090130335A1
  • Filed: 09/01/2006
  • Published: 05/21/2009
  • Est. Priority Date: 09/01/2005
  • Status: Abandoned Application
First Claim
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1. A plasma processing apparatus having a vacuum container, a sample electrode which is disposed inside the vacuum container and is to be mounted with a sample, a gas supply apparatus for supplying a gas to inside the vacuum container, plural gas flow-out holes formed in a dielectric window which is opposed to the sample electrode, an exhaust apparatus for exhausting the vacuum container, a pressure control device for controlling pressure in the vacuum container, and an electromagnetic coupling device for generating an electromagnetic field inside the vacuum container,wherein the dielectric window is composed of plural dielectric plates, grooves are formed in at least one of two confronting surfaces of the dielectric plates, gas passages are formed by the grooves and a flat surface of a dielectric plate opposed to the grooves, and gas supply portions for supplying the grooves with gases coming from the gas supply apparatus are provided;

  • andthe gas flow-out holes which are formed in a dielectric plate that is closest to the sample electrode communicate with the grooves inside the dielectric window.

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