Multilayer structural body and method for cleaning the same

• US 20090133713A1
• Filed: 07/12/2006
• Published: 05/28/2009
• Est. Priority Date: 07/14/2005
• Status: Abandoned Application

• Current Assignee: Nihon Ceratec Co., Ltd. (NGK Spark PLUG Company Limited), Tohoku University National Universities Corporation
• Original Assignee: Nihon Ceratec Co., Ltd. (NGK Spark PLUG Company Limited), Tohoku University National Universities Corporation
• Inventors: Kishi, Yukio, Ohtaki, Hiromichi, Ohmi, Tadahiro, Teramoto, Akinobu, Morinaga, Hitoshi, Tsutai, Yoshihumi
• Application Number:
  US11/988,648
• Publication Number:
  US 20090133713A1
• Time in Patent Office: Days
• US Class Current: 134/1
• CPC Class Codes: B08B 2203/0288 Ultra or megasonic jets
• CPC Class Codes: B08B 3/02 Cleaning by the force of jets or sprays
• CPC Class Codes: B08B 3/12 by sonic or ultrasonic vibrations washing or rinsing machines for crockery or tableware using sonic or ultrasonic waves A47L15/13; of natural teeth, of prostheses using ultrasonic techniques similar to those used for natural teeth A61C17/20; application of ultrasonic vibrations to chemical, physical or physico-chemical processes in general B01J19/10
• CPC Class Codes: C23C 16/405 of refractory metals or yttrium
• CPC Class Codes: C23C 16/545 for coating elongated substrates
• CPC Class Codes: C23C 26/00 Coating not provided for in groups C23C2/00 - C23C24/00
• CPC Class Codes: C23C 28/04 only coatings of inorganic non-metallic material
• CPC Class Codes: C23C 4/00 Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge build-up welding B23K, e.g. B23K5/18, B23K9/04
• CPC Class Codes: C23C 4/02 Pretreatment of the material to be coated, e.g. for coating on selected surface areas
• CPC Class Codes: C23C 4/11 Oxides
• CPC Class Codes: Y10T 428/25 Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
• CPC Class Codes: Y10T 428/252 Glass or ceramic [i.e., fired or glazed clay, cement, etc.] [porcelain, quartz, etc.]

Abstract

It has been difficult to provide a large-sized ceramic member quickly and economically. A multilayer structure is produced by forming a ceramic film on a base which is made of a material that can be shaped comparatively easily. The ceramic film is formed by a plasma spraying method, CVD method, PVD method, sol-gel method or the like. Alternatively, the ceramic film may be formed by a method combined with a spray deposit film.

Claims

1. A multilayer structural body comprising a base member and a film formed on a surface of said base member, wherein the number of adhering particles having a particle size of 0.2 μ

m or more is two or less per mm² on said film.

2. A multilayer structural body according to claim 1, wherein said base member is formed of a ceramic, a metal, or a composite material thereof.

3. A multilayer structural body according to claim 2, wherein said film is a ceramic film.

4. A multilayer structural body according to claim 3, wherein said ceramic film is a sprayed film deposited on said base member by spraying.

5. A multilayer structural body according to claim 3, wherein said film is a ceramic film deposited on said base member by a CVD method.

6. A multilayer structural body according to claim 3, wherein said film is a ceramic film deposited on said base member by a PVD method.

7. A multilayer structural body according to claim 3, wherein said film is a ceramic film deposited on said base member by a sol-gel method.

8. A multilayer structural body according to claim 3, wherein said film is formed on a sprayed film by at least one kind of method selected from a CVD method, a PVD method, and a sol-gel method.

9. A multilayer structural body according to claim 2, wherein said ceramic film has an adhesion strength of 10 MPa or more.

10. A method of cleaning a multilayer structural body, said multilayer structural body comprising a base member and a film formed on a surface of said base member, said method comprising a step of cleaning said film by applying an ultrasonic wave of 5 W/cm² or more and less than 30 W/cm².

11. A method according to claim 10, wherein said ultrasonic cleaning is performed using a nozzle-type cleaning apparatus.

12. A method according to claim 10, wherein said ultrasonic cleaning is performed by preparing a solution in which a gas selected from the group consisting of hydrogen, ammonia, and carbon dioxide is dissolved in ultrapure water, and applying the ultrasonic wave to said solution.

13. A method according to claim 11, wherein said ultrasonic cleaning is performed by preparing a solution in which a gas selected from the group consisting of hydrogen, ammonia, and carbon dioxide is dissolved in ultrapure water, and applying the ultrasonic wave to said solution.