METHODS AND APPARATUS FOR FORMING COLOR FILTER ON ARRAY FLAT PANEL DISPLAYS

• US 20090135348A1
• Filed: 10/23/2008
• Published: 05/28/2009
• Est. Priority Date: 10/26/2007
• Status: Abandoned Application

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: White, John M.
• Application Number:
  US12/257,383
• Publication Number:
  US 20090135348A1
• Time in Patent Office: Days
• US Class Current: 349/106
• CPC Class Codes: G02F 1/136209 Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
• CPC Class Codes: G02F 1/136222 Colour filters incorporated in the active matrix substrate
• CPC Class Codes: G02F 1/136227 Through-hole connection of the pixel electrode to the active element through an insulation layer

Abstract

The present invention provides a self-aligned color filter on array substrate made with a minimum number of masks. The invention includes forming opaque features on a substrate wherein the opaque features include circuit features, applying a pixel matrix material to the substrate, and applying an activation energy to portions of the pixel matrix material through the substrate using the opaque features as a mask. Numerous other aspects are provided.

Claims

1. A method comprising:

forming opaque features on a substrate wherein the opaque features include circuit features;

applying a pixel matrix material to the substrate; and

applying an activation energy to portions of the pixel matrix material through the substrate using the opaque features as a mask.

2. The method of claim 1 further comprising inkjet printing color material into pixel wells formed by applying the activation energy.

3. The method of claim 1 wherein the opaque features include data lines and gate lines.

4. The method of claim 1 wherein forming opaque features includes forming TFT circuit features.

5. The method of claim 1 wherein applying a pixel matrix material includes applying the pixel matrix material on the opaque features.

6. The method of claim 1 wherein applying a pixel matrix material includes applying the pixel matrix material on a side of the substrate opposite the opaque features.

7. The method of claim 6 wherein applying an activation energy includes applying the activation energy on a side of the substrate upon which the opaque features are formed.

8. The method of claim 1 wherein applying an activation energy includes applying the activation energy on a side of the substrate opposite the opaque features.

9. The method of claim 1 wherein applying an activation energy forms pixel wells in the pixel matrix material.

10. The method of claim 1 wherein applying the activation energy includes laser ablation of the pixel matrix material not shielded by the opaque features.

11. The method of claim 1 wherein applying the activation energy includes applying ultraviolet radiation.

12. The method of claim 1 wherein the pixel matrix material includes black matrix material.

13. The method of claim 1 wherein the pixel matrix material includes black matrix material that is phobic to color material and applying the activation energy includes laser ablation of the black matrix material not shielded by the opaque features.

14. The method of claim 13 wherein laser ablation of the black matrix material causes the formation of pixel wells with sidewalls that are philic to color material.

15. The method of claim 1 wherein the pixel matrix material is a photosensitive material.

16. The method of claim 15 wherein the photosensitive material is a positive photoresist.

17. An apparatus comprising:

a substrate including a color filter and a thin film transistor array, wherein the substrate is formed by the method of claim 1.

18. The apparatus of claim 17 wherein the color filter includes color material deposited using inkjet printing.

19. An apparatus comprising:

a substrate including a color filter and a thin film transistor array, wherein the substrate is formed by;

forming opaque features on the substrate wherein the opaque features include data lines and gate lines;

applying a positive photosensitive pixel matrix material to the substrate; and

lithographically exposing portions of the positive photosensitive pixel matrix material through the substrate using the opaque features as a mask.

20. A system comprising:

a first substrate with a transistor array and color filter wherein the first substrate is made by;

forming opaque features on a substrate wherein the opaque features include circuit features;

applying a pixel matrix material to the substrate; and

applying activation energy to portions of the pixel matrix material through the substrate using the opaque features as a mask;

a second substrate having a counter electrode;

a sealant for assembling the first substrate and the second substrate;

a spacer separating the first substrate and the second substrate;

a liquid crystal material between the first substrate and the second substrate; and

a polarizer associated with each of the first substrate and the second substrate.