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METHOD OF FORMING A SPACER

  • US 20090137126A1
  • Filed: 11/25/2008
  • Published: 05/28/2009
  • Est. Priority Date: 11/27/2007
  • Status: Active Grant
First Claim
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1. A method of forming a spacer, comprising:

  • forming on a substrate a pattern structure having a sidewall which is substantially upright with respect to the substrate;

    forming a spacer formation layer over the structure such that a portion of the spacer formation layer extends along the sidewall of the structure;

    forming a sacrificial layer on the spacer formation layer;

    forming a sacrificial layer pattern covering the portion of the spacer formation layer which extends along the sidewall of the pattern structure, wherein the forming of the sacrificial layer pattern comprises anisotropically etching the sacrificial layer using a wet etching solution; and

    forming a spacer on the sidewall of the pattern structure by etching the spacer formation layer using the sacrificial layer pattern as a mask.

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