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ETCH SYSTEM

  • US 20090139657A1
  • Filed: 09/10/2008
  • Published: 06/04/2009
  • Est. Priority Date: 12/04/2007
  • Status: Abandoned Application
First Claim
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1. A semiconductor processing system, comprising:

  • a factory interface;

    a central transfer chamber coupled to the factory interface;

    a first number of etch chambers coupled to the central transfer chamber, the first number of etch chambers being configured to etch a substrate at about a first processing time; and

    a second number of post-etch treatment chambers coupled to the central transfer chamber, the second number of post-etch treatment chambers being configured to process the substrate at about a second processing time, wherein a ratio of the first number to the second number is substantially proportional to a ratio of the first processing time to the second processing time.

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